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Slawomir Prucnal

Publications and source records attributed to Slawomir Prucnal.

At least 19 recordsLinked to original sources

Spatially resolved quantum magnetometry and stray-field reconstruction of permalloy microdisks using boron-vacancy centers in hexagonal boron nitride

Transferable hexagonal boron nitride (hBN) hosting negatively charged boron-vacancy (VB$^{-}$) spin defects offers a versatile platform for integrated quantum magnetometry, yet quantitative imaging of magnetic microstructures remains challenging. Here, we integrate a transferred hBN flake with a 4 $μ$m-diameter permalloy (Py = Ni${81}$Fe${19}$) microdisk and perform spatially resolved optically detected magnetic resonance measurements at room temperature. An applied in-plane magnetic field distorts the vortex-state magnetization, generating edge-localized magnetic surface charges and pronounced stray-field signatures at opposite disk edges. By referencing each pixel to its local zero-field splitting and correcting for a residual out-of-plane bias field, we quantitatively reconstruct the out-of-plane stray-field distribution, revealing peak fields of approximately 11.2 mT. An edge-charge model reproduces the spatial distribution and amplitude of the reconstructed field, linking the ODMR response to the field-driven evolution of the vortex state. These results establish transferred hBN VB$^{-}$ sensors for quantitative magnetometry of magnetic microstructures.

cond-mat.mes-hall↗

Structural and Optical Characteristics of $β-Ga_2O_3$ Implanted with Rare Earth Ions

We investigated the structural evolution and optical properties of $β-Ga_2O_3$ crystals implanted with different rare-earth (RE) ions using channeling Rutherford Backscattering Spectrometry, Positron Annihilation, Photoluminescence, and Photoluminescence Excitation spectroscopies. The studies reveal that implantation-induced disorder, accompanying phase transitions, and post-annealing structural recovery are largely insensitive to the implanted RE species. The defect microstructure is also found to be similar for all implanted RE ions. Thermal annealing does not completely remove radiation-induced defects but instead drives their rearrangement into larger defect complexes. Unimplanted (virgin) $β-Ga_2O_3$ exhibits strong UV-visible emission attributed to oxygen vacancies, whereas the introduction of RE ions produces additional emission lines originating from electronic transitions within RE3+ ions. The results indicate that RE3+ ions are excited through the host conduction band, followed by non-radiative relaxation to the 4f excited states and radiative decay to the respective ground states. Fluence-dependent studies of Yb3+ reveal the onset of concentration quenching, while RE-related emission remains efficient even in the presence of substantial lattice disorder. These findings provide new insight into defect evolution in ion-implanted beta-Ga2O3 and clarify the excitation mechanisms of RE3+ ions, offering guidance for optimizing the optical performance of $β-Ga_2O_3$:RE materials.

cond-mat.mtrl-sci↗

Comprehensive structural and optical analysis of differently oriented Yb-implanted $β$-Ga$_2$O$_3$

This study presents investigations of Yb-doped $β$-Ga$_2$O$_3$, an ultrawide bandgap semiconductor with potential use in future power and optoelectronic devices operating in high-radiation environments. The research has focused on the problem of structural damage caused by the implantation of Yb-ions into three differently oriented crystals and the optical response of created systems. The (001), (010), and (-201)-oriented $β$-Ga$_2$O$_3$ crystals were implanted with three different fluences of 150 keV Yb ions and examined using a variety of experimental techniques: high-resolution X-ray diffraction (HRXRD), Rutherford backscattering spectrometry in channeling mode (RBS/c), Raman and photoluminescence (PL) spectroscopies, to provide comprehensive information about studied systems. Furthermore, the RBS/c studies were supported by Monte Carlo simulations. The results show distinctions between differently oriented crystals. In particular, (010)-oriented crystals are characterized by the lowest concentration of extended defects and the presence of compressive stress. In contrast, samples with the other two orientations exhibit tensile stress and significantly higher levels of extended defects. Interestingly, the PL spectra of (010)-oriented $β$-Ga$_2$O$_3$ show the lowest emission from Yb$^{3+}$ ions, suggesting that specific types of extended defects, whose formation is more favorable in the other two orientations than in (010), enhance Yb$^{3+}$ luminescence instead of suppressing it.

cond-mat.mtrl-sci↗

A high-performance all-silicon photodetector enabling telecom-wavelength detection at room temperature

Photonic integrated circuits (PICs) are crucial for advancing optical communications, promising substantial gains in data transmission speed, bandwidth, and energy efficiency compared to conventional electronics. Telecom-wavelength photodetectors, operating near 1550 nm, are indispensable in PICs, where they enable the sensitive and low-noise conversion of optical signals to electrical signals for efficient data processing. While silicon is ideal for passive optical components, its limited absorption in the optical telecommunication range (1260-1625 nm) typically necessitates integrating an alternative material, such as germanium, for photodetection - a process that introduces significant fabrication challenges. Here, we present a high-performance, all-silicon waveguide-coupled photodetector, which operates at room temperature within the optical telecom C band. By introducing deep-level impurities into silicon at concentrations close to the solid-solubility limit, we enable efficient sub-bandgap absorption without compromising recombination carrier lifetimes and mobilities. This detector achieves a responsivity of 0.56 A/W, a quantum efficiency of 44.8%, a bandwidth of 2 GHz, and a noise-equivalent power of 4.2E-10 W/Hz1/2 at 1550 nm, fulfilling requirements for telecom applications. Our approach provides a scalable and cost-effective solution for the monolithic integration of telecom-wavelength photodetectors into silicon-based PICs, advancing the development of compact photonic systems for modern communication infrastructures.

physics.optics↗

Room-temperature alignment-free magnetometry with boron vacancies in hot-pressed hexagonal boron nitride

Magnetic field sensing is essential for applications in communication, environmental monitoring, and biomedical diagnostics. Quantum sensors based on solid-state spin defects, such as nitrogen-vacancy centers in diamond or boron vacancies in single-crystal hexagonal boron nitride (hBN), typically require precise alignment between the external magnetic field and the defect's spin quantization axis to achieve reliable sensing. This alignment constraint complicates device integration and hinders scalability. Here, we demonstrate room-temperature optically detected magnetic resonance (ODMR) from negatively charged boron vacancies (VB-) in commercially available hot-pressed polycrystalline hBN. The random grain orientation inherently samples a broad range of spin quantization axes, enabling alignment-free magnetic field detection. Numerical modeling further confirms that sensing remains feasible despite anisotropic sensitivity, establishing hot-pressed hBN as a robust and practical platform for quantum magnetometry. This approach paves the way toward low-cost, scalable, and mechanically stable quantum magnetic field sensors suitable for real-world deployment.

quant-ph↗

Si1-x-yGeySnx alloy formation by Sn ion implantation and flash lamp annealing

For many years, Si1-yGey alloys have been applied in the semiconductor industry due to the ability to adjust the performance of Si-based nanoelectronic devices. Following this alloying approach of group-IV semiconductors, adding tin (Sn) into the alloy appears as the obvious next step, which leads to additional possibilities for tailoring the material properties. Adding Sn enables effective band gap and strain engineering and can improve the carrier mobilities, which makes Si1-x-yGeySnx alloys promising candidates for future opto- and nanoelectronics applications. The bottom-up approach for epitaxial growth of Si1-x-yGeySnx, e.g., by chemical vapor deposition and molecular beam epitaxy, allows tuning the material properties in the growth direction only; the realization of local material modifications to generate lateral heterostructures with such a bottom-up approach is extremely elaborate, since it would require the use of lithography, etching, and either selective epitaxy or epitaxy and chemical-mechanical polishing giving rise to interface issues, non-planar substrates, etc. This article shows the possibility of fabricating Si1-x-yGeySnx alloys by Sn ion beam implantation into Si1-yGey layers followed by millisecond-range flash lamp annealing (FLA). The materials are investigated by Rutherford backscattering spectrometry, micro Raman spectroscopy, X-ray diffraction, and transmission electron microscopy. The fabrication approach was adapted to ultra-thin Si1-yGey layers on silicon-on-insulator substrates. The results show the fabrication of single-crystalline Si1-x-yGeySnx with up to 2.3 at.% incorporated Sn without any indication of Sn segregation after recrystallization via FLA. Finally, we exhibit the possibility of implanting Sn locally in ultra-thin Si1-yGey films by masking unstructured regions on the chip.

cond-mat.mtrl-sci↗

Structural changes in Ge1-xSnx and Si1-x-yGeySnx thin films on SOI substrates treated by pulse laser annealing

Ge1-xSnx and Si1-x-yGeySnx alloys are promising materials for future opto- and nanoelectronics applications. These alloys enable effective band-gap engineering, broad adjustability of their lattice parameter, exhibit much higher carrier mobility than pure Si, and are compatible with the CMOS technology. Unfortunately, the equilibrium solid solubility of Sn in Si1-xGex is less than 1% and the pseudomorphic growth of Si1-x-yGeySnx on Ge or Si can cause in-plane compressive strain in the grown layer, degrading the superior properties of these alloys. Therefore, post-growth strain engineering by ultrafast non-equilibrium thermal treatments like pulse laser annealing (PLA) is needed to improve the layer quality. In this article, Ge0.94Sn0.06 and Si0.14Ge0.8Sn0.06 thin films grown on silicon-on-insulator substrates by molecular beam epitaxy were post growth thermally treated by PLA. The material is analyzed before and after the thermal treatments by transmission electron microscopy, X-ray diffraction (XRD), Rutherford backscattering spectrometry, secondary ion mass spectrometry, and Hall effect measurements. It is shown that after annealing, the material is single-crystalline with improved crystallinity than the as-grown layer. This is reflected in a significantly increased XRD reflection intensity, well-ordered atomic pillars, and increased active carrier concentrations up to 4x1019 cm-3.

cond-mat.mtrl-sci↗

Probing the band splitting near the $Γ$ point in the van der Waals magnetic semiconductor CrSBr

This study investigates the electronic band structure of Chromium Sulfur Bromide (CrSBr) through comprehensive photoluminescence (PL) characterization. We clearly identify low-temperature optical transitions between two closely adjacent conduction-band states and two different valence-band states. The analysis of the PL data robustly unveils energy splittings, bandgaps and excitonic transitions across different thicknesses of CrSBr, ranging from monolayer to bulk. Temperature-dependent PL measurements elucidate the stability of the band splitting below the Néel temperature, suggesting that magnons coupled with excitons are responsible for the symmetry breaking and brightening of the transitions from the secondary conduction band minimum (CBM2) to the global valence band maximum (VBM1). Collectively, these results not only reveal band splitting in both the conduction and valence bands, but also point to an intricate interplay between the optical, electronic and magnetic properties of antiferromagnetic two-dimensional van der Waals crystals.

cond-mat.mes-hall↗

Strong Exciton-Phonon Coupling as a Fingerprint of Magnetic Ordering in van der Waals Layered CrSBr

The layered, air-stable van der Waals antiferromagnetic compound CrSBr exhibits pronounced coupling between its optical, electronic, and magnetic properties. As an example, exciton dynamics can be significantly influenced by lattice vibrations through exciton-phonon coupling. Using low-temperature photoluminescence spectroscopy, we demonstrate the effective coupling between excitons and phonons in nanometer-thick CrSBr. By careful analysis, we identify that the satellite peaks predominantly arise from the interaction between the exciton and an optical phonon with a frequency of 118 cm-1 (~14.6 meV) due to the out-of-plane vibration of Br atoms. Power-dependent and temperature-dependent photoluminescence measurements support exciton-phonon coupling and indicate a coupling between magnetic and optical properties, suggesting the possibility of carrier localization in the material. The presence of strong coupling between the exciton and the lattice may have important implications for the design of light-matter interactions in magnetic semiconductors and provides new insights into the exciton dynamics in CrSBr. This highlights the potential for exploiting exciton-phonon coupling to control the optical properties of layered antiferromagnetic materials.

cond-mat.mtrl-sci↗

Ferromagnetic interlayer coupling in CrSBr crystals irradiated by ions

Layered magnetic materials are becoming a major platform for future spin-based applications. Particularly the air-stable van der Waals compound CrSBr is attracting considerable interest due to its prominent magneto-transport and magneto-optical properties. In this work, we observe a transition from antiferromagnetic to ferromagnetic behavior in CrSBr crystals exposed to high-energy, non-magnetic ions. Already at moderate fluences, ion irradiation induces a remanent magnetization with hysteresis adapting to the easy-axis anisotropy of the pristine magnetic order up to a critical temperature of 110 K. Structure analysis of the irradiated crystals in conjunction with density functional theory calculations suggest that the displacement of constituent atoms due to collisions with ions and the formation of interstitials favors ferromagnetic order between the layers.

cond-mat.mtrl-sci↗

Intrinsic magnetic properties of the layered antiferromagnet CrSBr

Van der Waals magnetic materials are an ideal platform to study low-dimensional magnetism. Opposed to other members of this family, the magnetic semiconductor CrSBr is highly resistant to degradation in air, which, besides its exceptional optical, electronic, and magnetic properties, is the reason the compound is receiving considerable attention at the moment. For many years, its magnetic phase diagram seemed to be well-understood. Recently, however, several groups observed a magnetic transition in magnetometry measurements at temperatures of around 40 K that is not expected from theoretical considerations, causing a debate about the intrinsic magnetic properties of the material. In this letter, we report the absence of this particular transition in magnetization measurements conducted on high-quality CrSBr crystals, attesting to the extrinsic nature of the low-temperature magnetic phase observed in other works. Our magnetometry results obtained from large bulk crystals are in very good agreement with the magnetic phase diagram of CrSBr previously predicted by the mean-field theory; A-type antiferromagnetic order is the only phase observed below the Néel temperature at TN = 131 K. Moreover, numerical fits based on the Curie-Weiss law confirm that strong ferromagnetic correlations are present within individual layers even at temperatures much larger than TN.

cond-mat.mtrl-sci↗

On-chip lateral Si:Te PIN photodiodes for room-temperature detection in the telecom optical wavelength bands

Photonic integrated circuits require photodetectors that operate at room temperature with sensitivity at telecom wavelengths and are suitable for integration with planar complementary-metal-oxide-semiconductor (CMOS) technology. Silicon hyperdoped with deep-level impurities is a promising material for silicon infrared detectors because of its strong room-temperature photoresponse in the short-wavelength infrared region caused by the creation of an impurity band within the silicon band gap. In this work, we present the first experimental demonstration of lateral Te-hyperdoped Si PIN photodetectors operating at room temperature in the optical telecom bands. We provide a detailed description of the fabrication process, working principle, and performance of the photodiodes, including their key figure of merits. Our results are promising for the integration of active and passive photonic elements on a single Si chip, leveraging the advantages of planar CMOS technology.

physics.optics↗

On Curie temperature of B20-MnSi films

B20-type MnSi is the prototype magnetic skyrmion material. Thin films of MnSi show a higher Curie temperature than their bulk counterpart. However, it is not yet clear what mechanism leads to the increase of the Curie temperature. In this work, we grow MnSi films on Si(100) and Si(111) substrates with a broad variation in their structures. By controlling the Mn thickness and annealing parameters, the pure MnSi phase of polycrystalline and textured nature as well as the mixed phase of MnSi and MnSi1.7 are obtained. Surprisingly, all these MnSi films show an increased Curie temperature of up to around 43 K. The Curie temperature is likely independent of the structural parameters within our accessibility including the film thickness above a threshold, strain, cell volume and the mixture with MnSi1.7. However, a pronounced phonon softening is observed for all samples, which can tentatively be attributed to slight Mn excess from stoichiometry, leading to the increased Curie temperature.

cond-mat.mtrl-sci↗

Mid- and far-infrared localized surface plasmon resonances in chalcogen-hyperdoped silicon

Plasmonic sensing in the infrared region employs the direct interaction of the vibrational fingerprints of molecules with the plasmonic resonances, creating surface-enhanced sensing platforms that are superior than the traditional spectroscopy. However, the standard noble metals used for plasmonic resonances suffer from high radiative losses as well as fabrication challenges, such as tuning the spectral resonance positions into mid- to far-infrared regions, and the compatibility issue with the existing complementary metal-oxide-semiconductor (CMOS) manufacturing platform. Here, we demonstrate the occurrence of mid-infrared localized surface plasmon resonances (LSPR) in thin Si films hyperdoped with the known deep-level impurity tellurium. We show that the mid-infrared LSPR can be further enhanced and spectrally extended to the far-infrared range by fabricating two-dimensional arrays of micrometer-sized antennas in a Te-hyperdoped Si chip. Since Te-hyperdoped Si can also work as an infrared photodetector, we believe that our results will unlock the route toward the direct integration of plasmonic sensors with the one-chip CMOS platform, greatly advancing the possibility of mass manufacturing of high-performance plasmonic sensing systems.

cond-mat.mtrl-sci↗

B20-MnSi films grown on Si(100) substrates with magnetic skyrmion signature

Magnetic skyrmions have been suggested as information carriers for future spintronic devices. As the first material with experimentally confirmed skyrmions, B20-type MnSi was the research focus for decades. Although B20-MnSi films have been successfully grown on Si(111) substrates, there is no report about B20-MnSi films on Si(100) substrates, which would be more preferred for practical applications. In this letter, we present the first preparation of B20-MnSi on Si(100) substrates. It is realized by sub-second solid-state reaction between Mn and Si via flash-lamp annealing at ambient pressure. The regrown layer shows an enhanced Curie temperature of 43 K compared with bulk B20-MnSi. The magnetic skyrmion signature is proved in our films by magnetic and transport measurements. The millisecond-range flash annealing provides a promising avenue for the fabrication of Si-based skyrmionic devices.

cond-mat.mtrl-sci↗

Chlorine doping of MoSe2 flakes by ion implantation

The efficient integration of transition metal dichalcogenides (TMDs) into the current electronic device technology requires mastering the techniques of effective tuning of their optoelectronic properties. Specifically, controllable doping is essential. For conventional bulk semiconductors, ion implantation is the most developed method offering stable and tunable doping. In this work, we demonstrate n-type doping in MoSe2 flakes realized by low-energy ion implantation of Cl+ ions followed by millisecond-range flash lamp annealing (FLA). We further show that FLA for 3 ms with a peak temperature of about 1000 °C is enough to recrystallize implanted MoSe2. The Cl distribution in few-layer-thick MoSe2 is measured by secondary ion mass spectrometry. An increase in the electron concentration with increasing Cl fluence is determined from the softening and red shift of the Raman-active A_1g phonon mode due to the Fano effect. The electrical measurements confirm the n-type doping of Cl-implanted MoSe2. A comparison of the results of our density functional theory calculations and experimental temperature-dependent micro-Raman spectroscopy data indicates that Cl atoms are incorporated into the atomic network of MoSe2 as substitutional donor impurities.

cond-mat.mtrl-sci↗

Enhanced trion emission in monolayer MoSe2 by constructing a type-I van der Waals heterostructure

Trions, quasi-particles consisting of two electrons combined with one hole or of two holes with one electron, have recently been observed in transition metal dichalcogenides (TMDCs) and drawn increasing attention due to potential applications of these materials in light-emitting diodes, valleytronic devices as well as for being a testbed for understanding many-body phenomena. Therefore, it is important to enhance the trion emission and its stability. In this study, we construct a MoSe2/FePS3 van der Waals heterostructure (vdWH) with type-I band alignment, which allows for carriers injection from FePS3 to MoSe2. At low temperatures, the neutral exciton (X0) emission in this vdWH is almost completely suppressed. The ITrion/Ix0 intensity ratio increases from 0.44 in a single MoSe2 monolayer to 20 in this heterostructure with the trion charging state changing from negative in the monolayer to positive in the heterostructure. The optical pumping with circularly polarized light shows a 14% polarization for the trion emission in MoSe2/FePS3. Moreover, forming such type-I vdWH also gives rise to a 20-fold enhancement of the room temperature photoluminescence from monolayer MoSe2. Our results demonstrate a novel approach to convert excitons to trions in monolayer 2D TMDCs via interlayer doping effect using type-I band alignment in vdWH.

cond-mat.mtrl-sci↗

Dissolution of donor-vacancy clusters in heavily doped n-type germanium

The n-type doping of Ge is a self-limiting process due to the formation of vacancy-donor complexes (DnV with n <= 4) that deactivate the donors. This work unambiguously demonstrates that the dissolution of the dominating P4V clusters in heavily phosphorus-doped Ge epilayers can be achieved by millisecond-flash lamp annealing at about 1050 K. The P4V cluster dissolution increases the carrier concentration by more than three-fold together with a suppression of phosphorus diffusion. Electrochemical capacitance-voltage measurements in conjunction with secondary ion mass spectrometry, positron annihilation lifetime spectroscopy and theoretical calculations enabled us to address and understand a fundamental problem that has hindered so far the full integration of Ge with complementary-metal-oxide-semiconductor technology.

cond-mat.mtrl-sci↗