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Soohyun Im

Publications and source records attributed to Soohyun Im.

4 recordsLinked to original sources

Epitaxial stabilization of magnetic GdAuSb/LaAuSb superlattices

We report the epitaxial stabilization of GdAuSb films and GdAuSb/LaAuSb superlattices via molecular beam epitaxy on (0001)-oriented Al$_{2}$O$_{3}$ substrates. GdAuSb crystallize in the Au-Au dimerized YPtAs structure type (space group $P6_{3}/mmc$), the same structure as the Dirac semimetal LaAuSb. Angle-resolved photoemission spectroscopy (ARPES) measurements show similar near $E_F$ bandstructures for GdAuSb and LaAuSb, plus a rigid band shift for GdAuSb towards more hole-like behavior and core-like Gd $4f$ states $\sim 9$~eV below the Fermi energy. LaAuSb/GdAuSb superlattices exhibit sharp superlattice fringes by X-ray diffraction and atomically-precise interfaces by scanning transmission electron microscopy. Superlattices display two transitions in temperature-dependent resistvity, compared to a single N\'{e}el temperature for thick GdAuSb films. Superlattices of $Ln$AuSb materials ($Ln=$ rare earth) with atomically abrupt interfaces offer a new epitaxial platform for control of magnetic and topological order via tunable intralayer exchange and reduced dimensionality.

cond-mat.mtrl-sci

Growth and Structure of alpha-Ta films for Quantum Circuit Integration

Tantalum films incorporated into superconducting circuits have exhibited low surface losses, resulting in long-lived qubit states. Remaining loss pathways originate in microscopic defects which manifest as two level systems (TLS) at low temperature. These defects limit performance, so careful attention to tantalum film structures is critical for optimal use in quantum devices. In this work, we investigate the growth of tantalum using magnetron sputtering on sapphire, Si, and photoresist substrates. In the case of sapphire, we present procedures for growth of fully-oriented films with alpha-Ta [1 1 1] // Al2O3 [0 0 0 1] and alpha-Ta [1 -1 0] // Al2O3 [1 0 -1 0] orientational relationships, and having residual resistivity ratios (RRR) ~ 60 for 220 nm thick films. On Si, we find a complex grain texturing with Ta [1 1 0] normal to the substrate and RRR ~ 30. We further demonstrate airbridge fabrication using Nb to nucleate alpha-Ta on photoresist surfaces. For the films on sapphire, resonators show TLS-limited quality factors of 1.3 +/- 0.3 x 10^6 at 10 mK (for waveguide gap and conductor widths of 3 microns and 6 microns, respectively). Structural characterization using scanning electron microscopy, X-ray diffraction, low temperature transport, secondary ion mass spectrometry, and transmission electron microscopy reveal the dependence of residual impurities and screw dislocation density on processing conditions. The results provide practical insights for fabrication of advanced superconducting devices including qubit arrays, and guide future work on crystallographically deterministic qubit fabrication.

cond-mat.supr-con

Structural Heterogeneity, Ductility, and Glass Forming Ability of Zr-Based Metallic Glasses

We show the correlation between nanoscale structural heterogeneity and mechanical property and glass forming ability of Zr-based metallic glasses (MGs). Detailed parameters of medium range ordering (MRO) that constitutes the structural heterogeneity, including the type, size, and volume fraction of MRO domains determined using 4-dimensional scanning transmission electron microscopy, directly correlate with the ductility and glass forming ability of Zr-Cu-Co-Al MGs. Mesoscale deformation simulation incorporating the experimentally determined MRO confirms that the diverse types and sizes of MRO can significantly influence the MGs' mechanical behavior.

cond-mat.mtrl-sci

Three-Dimensional Imaging of Individual Point Defects Using Selective Detection Angles in Annular Dark Field Scanning Transmission Electron Microscopy

We propose a new scanning transmission electron microscopy (STEM) technique that can realize the three-dimensional (3D) characterization of vacancies, lighter and heavier dopants with high precision. Using multislice STEM imaging and diffraction simulations of beta-Ga2O3 and SrTiO3, we show that selecting a small range of low scattering angles can make the contrast of the defect-containing atomic columns substantially more depth-dependent. The origin of the depth-dependence is the de-channeling of electrons due to the existence of a point defect in the atomic column, which creates extra ripples at low scattering angles. We show that, by capturing the de-channeling signal with narrowly selected annular dark field angles (e.g. 20-40 mrad), the contrast of a column containing a point defect in the image can be significantly enhanced. The effect of sample thickness, crystal orientation, probe convergence angle, and experimental uncertainty will also be discussed. Our new technique can therefore create new opportunities for highly precise 3D structural characterization of individual point defects in functional materials.

cond-mat.mtrl-sci