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Stéphane Vézian

Publications and source records attributed to Stéphane Vézian.

6 recordsLinked to original sources

Unveiling nanolaser physics: Non-Perturbative Measurement of the Lasing-Mode Photon Population at the Sub-Picoseconds and Nanometer Scale

Semiconducting nanowire lasers (NWLs) constitute nanometer-scale modular and tunable light sources hence an essential component for integrated opto-electronics. However, improving and optimizing NWL operation requires characterization of their near-field and dynamics at the nanometer scale, which is hampered by the light diffraction limit. In this article, we show how to non-perturbatively measure the absolute number of photons in the nanolaser cavity above the lasing threshold with sub-picosecond resolution using a GaN nanowire nanolaser, as well as map the lasing mode spatial profile at the nanoscale. This technique, based on the simultaneous measurements of the photon induced near-field electron microscopy (PINEM) and the photons far-field, allows for the complete nanoscale and time-resolved characterization of a NWL in operation while monitoring its macroscopic optical properties.

physics.optics↗

Localized emission in MoSe$_2$ monolayers on GaN nanopillars

Solid-state quantum emitters (QEs) in two-dimensional semiconductors offer compact, chip-compatible sources for quantum photonics. In transition-metal dichalcogenides (TMDs), nanopillars are widely used to induce localized emission, yet the underlying confinement mechanism and the relative roles of strain versus dielectric environment remain unclear. The general problem addressed here is whether strain alone explains quantum emitter formation and placement in MoSe$_2$, or whether dielectric contrast at suspended-supported interfaces is also required. Here, we combine hyperspectral superlocalization of photoluminescence with co-registered AFM topography and phase to map the positions of localized states (LS) in MoSe$_2$ suspended on GaN pillars and correlate them with bending strain and the local dielectric context. Contrary to the common assumption of purely strain-driven activation, LS frequently occur at suspended--supported interfaces around the pillar apex and span a broad strain range without a clear threshold, while being scarce along high-strain ripples. Our data indicate that deterministic emitter positioning in Mo-based TMDs benefits from co-engineering both strain gradients and nanoscale dielectric heterogeneity, rather than strain alone. More broadly, this combined optical-mechanical characterization approach provides a general framework for mapping structure-property relationships in 2D quantum materials at the single-emitter level.

cond-mat.mes-hall↗

GaN mid-IR plasmonics: low-loss epsilon-near-zero modes

Epsilon-near-zero (ENZ) materials, defined by $ | Re(ε) | < 1$, enable unique light propagation characteristics, including confinement within sub-wavelength regions. To reduce losses in this regime, materials with both near-zero permittivity and $n<1$ refractive index, known as near-zero-index (NZI) materials, are desired. When both conditions are satisfied, the resulting region is classified as a low-loss ENZ medium combining strong light confinement with reduced optical losses. To achieve this behavior in the mid-IR, heavily doped semiconductors are required, and those compatible with current technologies are most desirable. This work provides the first in-depth study, supported by experimental demonstrations, of the plasmonic properties of highly doped GaN thin films on Si, exhibiting low optical losses and low-loss ENZ characteristics up to $3μm$. From the extracted optical parameters, the ENZ and NZI regions are determined and compared with the existing literature. As a result of the large polar character of nitrides, a hybridization of the surface plasmon and phonon polaritons is observed, accompanied by a flat-dispersion of the high-energy mode (pinned near the plasma frequency) indicative of its ENZ character. Establishing GaN as a viable platform for mid-IR ENZ-based plasmonics paves the way for integration into future infrared photonic technologies.

physics.optics↗

Molecular beam epitaxy of GaN/AlGaN quantum wells on bulk GaN substrate in the step-flow or step meandering regime: influence on indirect exciton diffusion

GaN/AlxGa1-xN quantum wells were grown by molecular beam epitaxy on high quality bulk (0001) GaN substrates. The quantum well thickness was set in the 6-8 nm range to favor the photoluminescence emission of indirect excitons. Indeed, such excitons are known to be spatially indirect, due to the presence of the internal electric field which spatially separates the electron and hole wave functions. The growth conditions were optimized in view of minimizing the photoluminescence peak broadening. In particular, the impact of growth temperature (up to 900°C) on the surface morphology, structural and photoluminescence properties was studied. The diffusion of indirect excitons on the scale of tens of microns was measured with a micro-photoluminescence setup equipped with a spatially resolved detection. A dedicated model and its analysis allow us to extract from these measurements the exciton diffusion constant and to conclude on the optimum growth conditions for the GaN/AlxGa1-xN quantum well structures suited for studies of quantum collective effects in indirect exciton liquids.

cond-mat.mtrl-sci↗

Probing nanoscale thermal transport with cathodoluminescence thermometry

Thermal properties have an outsized impact on efficiency and sensitivity of devices with nanoscale structures, such as in integrated electronic circuits. A number of thermal conductivity measurements for semiconductor nanostructures exist, but are hindered by the diffraction limit of light, the need for transducer layers, the slow-scan rate of probes, ultra-thin sample requirements, or extensive fabrication. Here, we overcome these limitations by extracting temperature from measurements of bandgap cathodoluminescence in GaN nanowires with spatial resolution limited by the electron cascade, and use this to determine thermal conductivities in the range of 19-68 W/m*K in three new ways. The electron beam acts simultaneously as a temperature probe and as a controlled delta-function-like heat source to measure thermal conductivities using steady-state methods, and we introduce a frequency-domain method using pulsed electron beam excitation. The different thermal conductivity measurements we explore agree within error where comparable. Our results provide novel methods of measuring thermal properties that allow for rapid, in-situ, high-resolution measurements of integrated circuits and semiconductor nanodevices, and open the door for electron-beam based nanoscale phonon transport studies.

cond-mat.mes-hall↗

AlN interlayer to improve the epitaxial growth of SmN on GaN (0001)

An in situ study of the epitaxial growth of SmN thin films on Ga-polar GaN (0001)templates by molecular beam epitaxy is reported. Using X-ray photoelectron spectroscopy we found that Ga segregates at the surface during the first stages of growth. We showed that the problem related to Ga surface segregation can be simply suppressed by growing a few monolayers of AlN before starting the SmN growth. This results in a significant improvement of the crystallinity of SmN thin films assessed by X-ray diffraction.

cond-mat.mtrl-sci↗