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Stanislav Haviar

Publications and source records attributed to Stanislav Haviar.

11 recordsLinked to original sources

Enhanced hydrogen response of copper-doped TiO$_2$ synthesised by helium-assisted magnetron sputtering

Cu-doped TiO$_2$ thin films for hydrogen sensing were synthesised by reactive DC magnetron sputtering in Ar/O$_2$/He mixtures, with the He fraction used as a control parameter for film growth. By combining normal-angle deposition (NAD) and glancing-angle deposition (GLAD) with post-deposition annealing, the effects of He on microstructure formation and sensor performance were examined. X-ray diffraction and electron microscopy revealed that He promotes nanostructuring, lattice expansion in as-deposited NAD films, increased porosity after annealing, and a stronger anatase character in the final oxide layers. These structural changes, which enhance the reactive surface area, lead to improved hydrogen sensing at 300\,$^\circ$C in 1~vol.\,\% H$_2$. The response of NAD films increased from 1.4 to 6.0 simply by replacing part of the argon with helium, whereas GLAD films showed only a modest increase. The observed nanostructuring is discussed in terms of a simulation-supported growth scenario involving energetic backscattered He, a reduced hammering effect, and cooling-related suppression of adatom mobility, which together favour the formation of a more open sensing layer. Helium-assisted sputtering represents a useful physical route for tailoring oxide thin films for gas-sensing applications.

cond-mat.mtrl-sci

Boron-assisted stabilization of low-resistivity mixed-valence Cu-O thin films prepared by reactive magnetron sputtering

This study systematically investigated the influence of boron incorporation in Cu-O thin films and the effect of oxygen partial pressure ($p_{\rm ox}$) on the phase evolution, chemical bonding, and electrical characteristics of the prepared films. A phase transition from Cu$_2$O to Cu$_2$O/Cu$_4$O$_3$ to CuO was observed as oxygen partial pressure increased. Boron incorporation significantly broadened the stability window of the Cu$_2$O and Cu$_4$O$_3$ phases and delayed the transition to CuO at higher oxygen partial pressure. In the highly B-doped Cu-O films, Cu$_4$O$_3$ was stabilized even under oxygen-rich conditions along with the CuO phase, suggesting that boron significantly altered the oxidation pathway. The formation of B-O and possible B-O-Cu configurations altered the local oxygen chemistry and promoted mixed-valence copper oxide phases. Electrical measurements revealed that highly B-doped Cu-O films exhibited a delayed transition from a high-resistivity low-$p_{\rm ox}$ regime to a low-resistivity mixed-valence regime, ultimately reaching approximately 0.06 $\Omega$ cm, among the lowest reported resistivities for a CuO-like material. These findings demonstrate that boron doping is an effective approach for tailoring the phase stability, defect chemistry, and electrical characteristics of Cu-O thin films for optoelectronic and photovoltaic applications.

cond-mat.mtrl-sci

Crystalline b-Ga2O3 thin films deposited via reactive magnetron sputtering of a liquid Ga target

Ga2O3 thin films were deposited by reactive magnetron sputtering from a liquid gallium target. The influence of deposition temperature, substrate type, and discharge parameters on the structural and electrical properties was systematically investigated. Films deposited on silicon and quartz glass exhibit polycrystalline growth, whereas sapphire substrates enable highly oriented growth of b-Ga2O3 with a preferred (-201) orientation. The lowest electrical resistivity of 7x10_3 ohm.cm was obtained for films deposited on sapphire at a temperature of 585C. At this temperature, the films reach sufficient crystalline quality to enable efficient charge carrier transport and thus the manifestation of unintentional conductivity. At higher deposition temperatures, pronounced crystallization occurs; however, it is not homogeneous throughout the entire film thickness, which leads to a deterioration of the electrical properties. These results demonstrate that, despite intrinsic limitations, reactive magnetron sputtering can be successfully employed for the preparation of Ga2O3 thin films with optimized electrical properties when appropriate substrates and deposition temperatures are selected.

cond-mat.mtrl-sci

Corrosion-resistant and conductive Ti-Nb-O coatings tailored for ultra-low Pt-loaded BPPs and PTLs in PEM electrolyzers

We develop highly corrosion-resistant and conductive Ti-Nb-O coatings for metallic components -- bipolar plates (BPPs) and porous transport layers (PTLs) -- in PEM water electrolyzers. Using reactive high-power impulse magnetron sputtering (HiPIMS), we deposit compact 200 nm bilayer coatings onto SS316L substrates, systematically tailoring their composition. By precisely controlling oxygen partial pressure and Nb/Ti ratio, we adjust stoichiometry and structure, directly affecting electrical resistivity and corrosion resistance. We examine interfacial contact resistance (ICR) and electrochemical parameters before and after accelerated corrosion testing. Optimized coatings exhibit resistivity on the order of 10^-4 Ohmcm and extremely low corrosion current densities (J_corr = 0.01-0.08 uA/cm^2), well below the U.S. DOE 2026 target. Most importantly, these coatings enable the ICR target after accelerated corrosion testing with a Pt overlayer as thin as 5 nm, reducing Pt loading by up to two orders of magnitude compared to conventional approaches.

cond-mat.mtrl-sci

High-performance thermochromic multilayer coatings with W-doped VO2 nanoparticles dispersed in SiO2 matrix prepared on glass at a low temperature

We report a high-performance thermochromic VO2-based coating prepared by using a three-step process, consisting of magnetron sputter depositions of SiO2 films and V-W films and their postannealing, on standard glass at a low substrate temperature of 350 {\deg}C without opening the vacuum chamber to atmosphere. It is formed by four layers of W-doped VO2 nanoparticles dispersed in SiO2 matrix. The coating exhibits a transition temperature of 33 {\deg}C with an integral luminous transmittance of 65.4% (low-temperature state) and 60.1% (high-temperature state), and a modulation of the solar energy transmittance of 15.3%. Such a combination of properties, together with the low temperature during preparation, fulfill the requirements for large-scale implementation on building glass and have not been reported yet.

cond-mat.mtrl-sci

Ultra-low-resistivity nitrogen-doped p-type Cu2O thin films fabricated by reactive HiPIMS

We have successfully fabricated the nitrogen-doped cuprous oxide thin films on the amorphous standard soda-lime glass by reactive high-power impulse magnetron sputtering. The energy of film-forming particles was controlled by the value of pulse-averaged target power density, which has a significant impact on the elemental composition, structure and optoelectrical properties of the films. We have shown that the high-energy regime is more suitable for preserving Cu2O structure and leads to continuous substitution of oxygen by nitrogen compared with the low-energy regime. Moreover, in the high-energy regime, it is possible, to some extent, to independently control the electrical resistivity and optical properties. The electrical resistivity decreases down to 5 x10-2 ohm.cm at the optical band gap 2.0-2.3 eV. Special attention is paid to the formation of nitrogen molecules and their ability to form shallow acceptor states. Experimental results supported by our DFT calculations indicate that N2 replacing Cu in the Cu2O lattice is one possible (but not the only possible) acceptor. We have also found that the formation of nitrogen molecules is preferred in a high-energy regime.

cond-mat.mtrl-sci

Thermally-induced microstructural evolution in nanoparticle-based CuO, WO$_3$ and CuO-WO$_3$ thin films for hydrogen gas sensing

This study systematically investigates the microstructural evolution of nanoparticle-based CuO, WO$_3$, and composite 'CuO-WO$_3$' thin films induced by their post-deposition annealing. The films were reactively deposited using a magnetron-based gas aggregation technique, with the composite films consisting of alternating monolayers of CuO and WO$_3$ nanoparticles. After deposition, the films were annealed in synthetic air at temperatures ranging from 200 to 400$^\circ$C and characterized using scanning electron microscopy, X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy. Annealing of the CuO films led to the most pronounced changes associated with a gradual enhancement of crystallinity accompanied by significant particle growth with increasing annealing temperature, while the WO$_3$ and CuO-WO$_3$ films were more thermally stable to crystallization and particle growth. Notably, at 400$^\circ$C, the CuO--WO$_3$ films crystallized into a novel $\gamma$-CuWO$_4$ phase. The annealed films were further evaluated for their gas-sensing performance upon H$_2$ exposure and the obtained results were analyzed in relation to film properties and the microstructural evolution induced by annealing.

cond-mat.mtrl-sci

New polymorph {\gamma}-CuWO4 inspired by {\gamma}-CuMoO4: experimental identification and theoretical verification

In the context of our efforts to develop hydrogen gas sensors, two samples of ternary CuWO4 with the same crystalline structure have been prepared by two different non-equilibrium techniques. We show that the materials' structure is significantly different from the known stable one, and we identify that it is very similar to that of previously reported {\gamma}-CuMoO4. We use ab initio calculations to confirm that the newly identified phase, {\gamma}-CuWO4, represents a local energy minimum. We present very similar calculated and measured lattice constants and X-ray diffractograms. We make a case that the low-temperature formation of the metastable {\gamma}-CuWO4 phase is facilitated by easier kinetics and/or by Cu-rich composition of our samples, and we show that it converts to the stable phase after annealing to 600 {\deg}C.

cond-mat.mtrl-sci

Extraordinary oxidation behavior of W-Zr thin-film metallic glasses: A route for tailoring functional properties of W-Zr-O films

The oxidation behavior of W-Zr thin-film metallic glasses (TFMGs) with 32, 48 and 61 at.% Zr, prepared by dc magnetron co-sputtering, was comprehensively studied after annealing in synthetic air. The study focuses on the effect of the annealing temperature (up to 600{\deg}C) on the oxidation process, oxygen saturation, structure evolution, and their subsequent impact on electrical, optical and mechanical properties. The findings reveal that controlled oxidation transforms W-Zr TFMGs into amorphous ceramic W-Zr-O films with substoichiometric compositions. This is a consequence of an oxidation process that does not proceed through the formation of a stoichiometric oxide layer on the surface of W-Zr TFMGs, acting as a diffusion barrier against fast oxidation, but leads to a gradual incorporation of oxygen across the film volume due to thermodynamics factors. Higher Zr content accelerates the oxygen incorporation and its depth uniformity in the films. As a result, the mechanical properties are significantly enhanced achieving hardness values of up to 17.5 GPa at approximately 50% oxygen saturation. Simultaneously, the electrical and optical properties are finely tuned with the resistivity and the extinction coefficient (measured at 550 nm) ranging from 1.7 to 95.7x10-4 Ohm.cm and 0.28 to 1.06, respectively.

cond-mat.mtrl-sci

A low-temperature synthesis of strongly thermochromic W and Sr co-doped VO2 films with a low transition temperature

The reversible semiconductor-to-metal transition of vanadium dioxide (VO2) makes VO2-based coatings a promising candidate for thermochromic smart windows, reducing the energy consumption of buildings. We report low-temperature (320 degC) depositions of thermochromic V1-x-yWxSryO2 films with a thickness of 71-73 nm onto 170-175 nm thick Y-stabilized ZrO2 layers on a 1 mm thick conventional soda-lime glass. The developed deposition technique is based on reactive high-power impulse magnetron sputtering with a pulsed O2 flow feedback control allowing us to prepare crystalline W and Sr co-doped VO2 films of the required stoichiometry without any substrate bias or post-deposition annealing. The W doping of VO2 decreases the transition temperature below 25 degC, while the Sr doping of VO2 increases the integral luminous transmittance, Tlum, significantly due to widening of the visible-range optical band gap, which is consistent with lowering of the absorption coefficient of films. We present the discussion of the effect of the Sr content in the metal sublattice of VO2 on the electronic and crystal structure of V1-x-yWxSryO2 films, and on their temperature-dependent optical and electrical properties. An optimized V0.855W0.018Sr0.127O2 film exhibits a high Tlum = 56.8% and modulation of the solar energy transmittance deltaTsol = 8.3%, which are 1.50 times and 1.28 times, respectively, higher compared with those of the V0.984W0.016O2 film. The achieved results constitute an important step toward a low-temperature synthesis of large-area thermochromic VO2-based coatings for future smart-window applications, as it is easy to further increase the Tlum and deltaTsol by >6% and >3%, respectively, using a 280 nm thick top SiO2 antireflection layer.

cond-mat.mtrl-sci

Design and Scalable Synthesis of Thermochromic VO2-Based Coatings for Energy-Saving Smart Windows with Exceptional Optical Performance

We report strongly thermochromic YSZ/V0.855W0.018Sr0.127O2/SiO2 coatings, where YSZ is Y stabilized ZrO2, prepared using a scalable deposition technique on standard glass at a low substrate temperature of 320 {\deg}C and without any substrate bias voltage. The coatings exhibit a transition temperature of 22 {\deg}C with an integral luminous transmittance of 63.7% (low-temperature state) and 60.7% (high-temperature state), and a modulation of the solar energy transmittance of 11.2%. Such a combination of properties, together with the low deposition temperature, fulfill the requirements for large-scale implementation on building glass and have not been reported yet. Reactive high-power impulse magnetron sputtering with a pulsed O2 flow feedback control allows us to prepare crystalline W and Sr co-doped VO2 of the correct stoichiometry. The W doping of VO2 decreases the transition temperature, while the Sr doping of VO2 increases the luminous transmittance significantly. A coating design utilizing a second-order interference in two antireflection layers is used to maximize both the integral luminous transmittance and the modulation of the solar energy transmittance. A compact crystalline structure of the bottom YSZ antireflection layer further improves the VO2 crystallinity, while the top SiO2 antireflection layer provides also the mechanical and environmental protection for the V0.855W0.018Sr0.127O2 layer.

physics.app-ph