arXiv subjects

Sylvain Baudot

Publications and source records attributed to Sylvain Baudot.

7 recordsLinked to original sources

arXiv2026

SiMOS quantum-dot spin qubits enabled by extreme-ultraviolet lithography

The realization of large-scale silicon quantum processors requires spin qubits compatible with advanced semiconductor manufacturing technologies, demanding lithographic processes that combine nanometer-scale precision with exceptional uniformity. Although the highest-performing silicon spin qubits demonstrated to date have relied on electron-beam (e-beam) lithography, its serial exposure process limits reproducibility studies and wafer-scale fabrication. Here, we demonstrate high-performance silicon metal-oxide-semiconductor (SiMOS) spin qubits fabricated using extreme-ultraviolet (EUV) lithography in a 300 mm semiconductor pilot line. We report wafer-scale quantum-dot uniformity metrics, including 100 % room-temperature gate-to-gate leakage yield and sub-nanometer control of critical gate dimensions. We characterize four double-dot systems realized in two triple-quantum-dot devices. Gate set tomography (GST) reveals consistently high fidelities across all four systems, with values up to 99.8 % for SPAM, 99.9 % for single-qubit gates, and 99.1 % for two-qubit gates. The devices exhibit highly reproducible exchange turn-on characteristics of 10-13 dec/V, indicating high fabrication uniformity enabled by EUV patterning. These results establish EUV lithography as a viable manufacturing technology for quantum processors based on high-fidelity SiMOS spin qubits.

cond-mat.mes-hall↗

arXiv2026

Eight-Qubit Operation of a 300 mm SiMOS Foundry-Fabricated Device

Silicon spin qubits are a promising platform for quantum computing due to their high coherence, controllability, and CMOS manufacturability, yet scalable implementations have so far been limited to a few qubits. Here, to take a step towards larger qubit systems, we tune and coherently control an eight-dot linear array of silicon spin qubits fabricated in a 300~mm CMOS-compatible foundry process, establishing operational scalability beyond the two-qubit regime. All eight qubits are successfully tuned and characterized as four double-dot pairs, exhibiting Ramsey dephasing times $T_2^*$ up to 41(2)$~μ$s and Hahn-echo coherence times $T_2^{\mathrm{Hahn}}$ up to 1.31(4)$~$ms. Readout of the central four qubits is achieved via a cascaded charge-sensing protocol, enabling high-fidelity measurements of the entire multi-qubit array in a two step process. Additionally, we demonstrate a two-qubit gate operation between adjacent qubits with low phase noise. We show that silicon spin qubit arrays can be scaled to medium-sized arrays of 8 qubits while maintaining system coherence.

quant-ph↗

arXiv2026

Concatenated continuous driving of silicon qubit by amplitude and phase modulation

The rate of coherence loss is lower for a qubit under the Rabi drive than a freely evolving qubit $T_{2}^{\rm{Rabi}}>T_{2}^*$. Building on this principle, concatenated continuous driving (CCD) keeps the qubit under continuous drive to suppress noise and manipulate dressed states by either phase or amplitude modulation. In this work, we propose a variant of CCD which simultaneously modulates both the amplitude and phase of the driving field to generate a circularly polarized field in the rotating frame of the carrier frequency. This circular-modulated CCD(CMCCD) cancels the counter-rotating term in the second rotating frame, eliminating a systematic pulse-area error that arises from an imperfect rotating wave approximation for fast gates. Numerical simulations demonstrate that the proposed CMCCD achieves higher gate fidelity than conventional CCD schemes. We further implement and compare different CCD protocols using an electron spin-qubit in an isotopically purified $^{28}$Si-MOS quantum dot and evaluate its robustness by applying static detuning and Rabi frequency errors. The robustness is significantly improved compared with the standard Rabi drive, showing the effectiveness of this scheme for qubit arrays with variation in qubit frequency, coupling to the Rabi drive, and low-frequency noise. The proposed scheme can be applied to various physical systems, including trapped atoms, cold atoms, superconducting qubits, and NV centers.

quant-ph↗

arXiv2026

Understanding oxide-thickness-dependent variability in dense Si-MOS quantum dot arrays

Achieving uniform and scalable control of semiconductor spin qubits remains a key challenge for large scale quantum computing. In this work, we investigate how gate oxide thickness influences uniformity in dense two dimensional silicon quantum dot arrays. Using a 7 x 7 array fabricated in a 300 mm CMOS-process patterned by EUV lithography, we statistically characterize 392 quantum dots across four different oxide thicknesses. The threshold voltages, capacitances, lever arms, and charging energies are extracted using parallel row based measurements and we identify an optimal SiO2 thickness of 17 nm that minimizes threshold voltage variability below 63 mV standard deviation. Our observations illustrate how multiple sources of disorder can introduce competing oxide-thickness dependencies, resulting in non-monotonic trends. These results provide key design guidelines for dense, scalable silicon spin qubit architectures.

quant-ph↗

arXiv2026

Valley enhanced Rabi frequency in n-type planar Silicon-MOS quantum dot

Electron spin resonance spectroscopy (ESR) of a single electron in planar Si-MOS quantum dot is reported in the vicinity of a valley level anti-crossing. A number of one and two-photon resonances are observed due to mixing of magnetic spin-flip and electric valley-flip transitions. This allows the reconstruction of the energy-level diagram of a four state system with two valley and two spin states. Near the anti-crossing, an enhancement of the Rabi frequency is observed. This is attributed to an electric-dipole transition activated by admixing of the upper energy level due to inter-valley spin coupling. The electric-dipole transition may be driven via capacitive coupling between the ESR antenna, and the confinement gate. To characterize spin-valley coupling responsible for the enhancement, we measure the anisotropy of the g-factor difference between the two valley states, the mean g-factor and the inter-valley spin coupling for both in and out-of-plane magnetic fields. The inter-valley spin coupling is strongly modulated by the direction of the B-field, and is strongest for out-of-plane B-field, consistent with an in-plane spin-valley field. In principle, this strong Electric dipole spin resonance (EDSR) effect could be utilized for fast all-electrical spin control in small-scale devices.

cond-mat.mes-hall↗

arXiv2025

High Fidelity Qubit Control in a Natural Si-MOS Quantum Dot using a 300 mm Silicon on Insulator Wafer

We demonstrate high-fidelity single qubit control in a natural Si-MOS quantum dot fabricated in an industrial 300 mm wafer process on a silicon on insulator (SOI) wafer using electron spin resonance. A relatively high optimal Rabi frequency of 5 MHz is achieved, dynamically decoupling the electron spin from its 29-Si environment. Tracking the qubit frequency reduces the impact of low frequency noise in the qubit frequency and improves the $T^{Rabi}$ from 7 to 11 $μ$s at a Rabi frequency of 5 MHz, resulting in Q-factors exceeding 50. Randomized benchmarking returns an average single gate control fidelity of 99.5 $\pm$ 0.3%. As a result of pulse-area calibration, this fidelity is limited by the Rabi Q-factor. These results show that a fast Rabi frequency, low charge noise, and a feedback protocol enable high fidelity in these Si-MOS devices, despite the low-frequency magnetic noise.

cond-mat.mes-hall↗

arXiv2024

A 300 mm foundry silicon spin qubit unit cell exceeding 99% fidelity in all operations

Fabrication of quantum processors in advanced 300 mm wafer-scale complementary metal-oxide-semiconductor (CMOS) foundries provides a unique scaling pathway towards commercially viable quantum computing with potentially millions of qubits on a single chip. Here, we show precise qubit operation of a silicon two-qubit device made in a 300 mm semiconductor processing line. The key metrics including single- and two-qubit control fidelities exceed 99% and state preparation and measurement fidelity exceeds 99.9%, as evidenced by gate set tomography (GST). We report coherence and lifetimes up to $T_\mathrm{2}^{\mathrm{*}} = 30.4$ $μ$s, $T_\mathrm{2}^{\mathrm{Hahn}} = 803$ $μ$s, and $T_1 = 6.3$ s. Crucially, the dominant operational errors originate from residual nuclear spin carrying isotopes, solvable with further isotopic purification, rather than charge noise arising from the dielectric environment. Our results answer the longstanding question whether the favourable properties including high-fidelity operation and long coherence times can be preserved when transitioning from a tailored academic to an industrial semiconductor fabrication technology.

cond-mat.mes-hall↗