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Teun A. J. van Schijndel

Publications and source records attributed to Teun A. J. van Schijndel.

6 recordsLinked to original sources

Digital Etching of Single-Crystalline Silicon Fin Barriers Down to Sub-10 nm

This work presents a fabrication process to realize sub-10 nm-thick, high-aspect-ratio Si fins using high-resistivity float-zone single-crystal Si wafers. Following anisotropic wet etching, a digital etching process based on repeated rapid thermal annealing (RTA) oxidation and vapor-phase hydrofluoric acid (VHF) etching of the resulting oxide was developed, enabling thinning of Si fins into the sub-10 nm regime. Cross-sectional scanning transmission electron microscopy confirms fin thicknesses as thin as 6 nm, although with a tapered profile resulting from the initial anisotropic wet etch. Tapering of the fin was reduced by using an N{_2}/O{_2} (5:1) ambient together with a reduced ramp rate during the temperature ramping for the RTA oxidation process. A thickness variation of 3 nm along a 1.2 μm tall fin was achieved on a fin with 12 nm near the top and 15 nm near the base. The developed process provides a pathway for fabricating Josephson junctions, setting a foundation toward reproducible and scalable superconducting qubit fabrication with single-crystal Si dielectric barriers using readily available Si processing technology.

cond-mat.mtrl-sci↗

Understanding the superconducting proximity effect in semiconductors through quantum oscillations

Superconductor-semiconductor hybrids host emergent states of matter and offer a platform for new qubits, but the superconducting metal shunts electrical transport, which rules out conventional semiconductor characterization and leaves the hybrid parameters to speculation. Here we determine density, mass, $g$-factor, mobility and subband occupation beneath the superconductor, from Shubnikov-de Haas oscillations of a buried InAs quantum well under Al, Sn, V, Nb, Ta and Re films, with a Dingle analysis that accounts for the shunt. Every metal adds an interface subband whose occupation falls into one of two classes, whereas the mass and $g$-factor of the buried well are unchanged to within 10\%. Within the uncertainty set by the transport mobility, no film shortens the quantum lifetime of the buried well, and Al and Sn lengthen it. Quantum lifetimes bound the hybridization of the interface subband to 2-4~meV. These measurements supply the normal-state parameters that tunnelling spectroscopy renormalizes but cannot measure.

cond-mat.supr-con↗

Cryogenic growth of aluminum: structural morphology, optical properties, superconductivity and microwave dielectric loss

We explore the molecular beam epitaxy synthesis of superconducting aluminum thin films grown on c-plane sapphire substrates at cryogenic temperatures of 6 K and compare their behavior with films synthesized at room temperature. We demonstrate that cryogenic growth increases structural disorder, producing crystalline grains that modify the optical, electrical, and superconducting properties of aluminum. We observe that cryogenic deposition changes the color of aluminum from fully reflective to yellow and correlate the pseudo-dielectric function and reflectance with structural changes in the film. We find that smaller grain sizes enhance the superconductivity of aluminum, increasing its critical temperature and critical field. We then estimate the superconducting gap and coherence length of Cooper pairs in aluminum in the presence of disorder. Finally, we fabricate superconducting microwave resonators on these films and find that, independently of the growth temperature, the system is dominated by two-level system loss with similar quality factors in the high and low power regimes. We further measure a higher kinetic inductance in the cryogenically grown films.

cond-mat.supr-con↗

Cryogenic growth of tantalum thin films for low-loss superconducting circuits

Motivated by recent advancements highlighting Ta as a promising material in low-loss superconducting circuits and showing long coherence times in superconducting qubits, we have explored the effect of cryogenic temperatures on the growth of Ta and its integration in superconducting circuits. Cryogenic growth of Ta using a low temperature molecular beam epitaxy (MBE) system is found to stabilize single phase $α$-Ta on several different substrates, which include Al$\mathrm{_2}$O$\mathrm{_3}$(0001), Si(001), Si(111), SiN${_x}$, and GaAs(001). The substrates are actively cooled down to cryogenic temperatures and remain < 20 K during the Ta deposition. X-ray $θ$-2$θ$ diffraction after warming to room temperature indicates the formation of polycrystalline $α$-Ta. The 50 nm $α$-Ta films grown on Al$\mathrm{_2}$O$\mathrm{_3}$(0001) at a substrate manipulator temperature of 7 K have a room temperature resistivity ($\mathrm{ρ_{300 K}}$) of 13.4 $\mathrm{μΩ}$cm, a residual resistivity ratio (RRR) of 17.3 and a superconducting transition temperature (T$_C$) of 4.14 K, which are comparable to bulk values. In addition, atomic force microscopy (AFM) indicates that the film grown at 7 K with an RMS roughness of 0.45 nm was significantly smoother than the one grown at room temperature. Similar properties are found for films grown on other substrates. Results for films grown at higher substrate manipulator temperatures show higher $\mathrm{ρ_{300 K}}$, lower RRR and Tc, and increased $β$-Ta content. Coplanar waveguide resonators with a gap width of 3 $\mathrmμ$m fabricated from cryogenically grown Ta on Si(111) and Al$\mathrm{_2}$O$\mathrm{_3}$(0001) show low power Q$_i$ of 1.9 million and 0.7 million, respectively, indicating polycrystalline $α$-Ta films may be promising for superconducting qubit applications even though they are not fully epitaxial.

cond-mat.supr-con↗

Enhanced mobility of ternary InGaAs quantum wells through digital alloying

High In content InGaAs quantum wells (In $\geq$ 75%) are potentially useful for topological quantum computing and spintronics applications. In high mobility InGaAs quantum wells, alloy disorder scattering is a limiting factor. In this report, we demonstrate that by growing the InGaAs quantum wells as a digital alloy, or a short period superlattice, we can reduce the alloy disorder scattering within the quantum well and increase the peak 2 K electron mobility to 545,000 cm^2/V s, which is the highest reported mobility for high In content InGaAs quantum wells to the best of the authors' knowledge. Our results demonstrate that the digital alloy approach can be used to increase the mobility of quantum wells in random alloy ternary materials.

cond-mat.mes-hall↗

Electronic structure of InSb (001), (110), and (111)B surfaces

The electronic structure of various (001), (110), and (111)B surfaces of n-type InSb were studied with scanning tunneling microscopy and spectroscopy. The InSb(111)B (3x1) surface reconstruction is determined to be a disordered (111)B (3x3) surface reconstruction. The surface Fermi-level of the In rich and the equal In:Sb (001), (110), and (111)B surface reconstructions was observed to be pinned near the valence band edge. This observed pinning is consistent with a charge neutrality level lying near the valence band maximum. Sb termination was observed to shift the surface Fermi-level position by up to $254 \pm 35$ meV towards the conduction band on the InSb (001) surface and $60 \pm 35$ meV towards the conduction band on the InSb(111)B surface. The surface Sb on the (001) can shift the surface from electron depletion to electron accumulation. We propose the shift in the Fermi-level pinning is due to charge transfer from Sb clusters on the Sb terminated surfaces. Additionally, many sub-gap states were observed for the (111)B (3x1) surface, which are attributed to the disordered nature of this surface. This work demonstrates the tuning of the Fermi-level pinning position of InSb surfaces with Sb termination.

cond-mat.mtrl-sci↗