arXiv subjects

Thilo Remmele

Publications and source records attributed to Thilo Remmele.

3 recordsLinked to original sources

arXiv2026

Sharp periodic Ge concentration modulations beyond the conduction band valley wavevector $k_0$ in nuclear spin-free Si quantum wells

Periodic Ge modulations within strained Si quantum wells in SiGe heterostructures offer a route to deterministically enhance conduction-band valley splitting in Si, a key requirement for scalable spin-qubit quantum computing. Efficient enhancement requires modulations in the order of the Si valley wavevector $k_0$ (9.7 nm$^{-1}$), corresponding to a period of 0.64 nm and near-monolayer growth control. Using nuclear-spin-free molecular beam epitaxy with $^{28}$Si and $^{72}$Ge, we demonstrate Ge-modulated Si quantum wells with periods from 2.00 to 0.49 nm, including modulations at $k_0$ and $2k_0/3$. Synchrotron X-ray techniques and scanning transmission electron microscopy reveal laterally homogeneous Ge modulations over micrometer scales, with amplitudes up to 10 at-% and gradients reaching 20 at-%/nm. Two-bands $\mathbf{k}\cdot\mathbf{p}$ simulations suggest deterministic enhancement of valley splittings in steep trapezoidal $2k_0/3$ heterostructures, while the effect in $k_0$-type quantum wells is much weaker.

physics.app-ph↗

arXiv2026

Epitaxy of strained, nuclear-spin free $^{76}$Ge quantum wells from solid source materials

Germanium quantum well heterostructures have rapidly emerged as a leading platform for solid-state quantum information processing; however, material quality limits scalability, and higher structural quality, higher purity, as well as zero nuclear spin, are required. Here, we address these problems by employing the heaviest of Ge isotopes, by evaporating high-purity $^{76}$Ge radiation detector material, as utilized in fundamental neutrino particle physics experiments, to fabricate $^{76}$Ge/$^{28}$Si$^{76}$Ge quantum wells for quantum applications and explore the respective challenges. Specifically, we demonstrate improved results on strain-relaxed virtual Si$_{0.2}$Ge$_{0.8}$ substrates, forward graded from Si, with a dislocation density below 3.7$\cdot$10$^{5}$ cm$^{-2}$, explore nuclear spin-free solid-source molecular beam epitaxy, and demonstrate first quantum transport in $^{76}$Ge quantum wells. We demonstrate a record-level quantum well interface width of 0.3 nm by X-ray reflectivity, and quantitatively compare it to atom probe tomography and scanning transmission electron microscopy. The grown layer reveals nuclear-spin-bearing impurity concentrations below 10$^{19}$ cm$^{-3}$ and chemical impurity levels below 10$^{18}$ cm$^{-3}$, except for residual carbon attributed to the graphite crucible of the Ge source, which may reach up to 10$^{19}$ cm$^{-3}$. Low-temperature magneto-transport measurements yield electron mobilities of 6.1$\cdot$10$^4$ cm$^2$V$^{-1}$s$^{-1}$ at 15 mK with a carrier density of 2.2$\cdot$10$^{11}$ cm$^{-2}$, indicating that residual carbon is the dominant scattering mechanism.

physics.app-ph↗

arXiv2020

Plasma-assisted molecular beam epitaxy of NiO on GaN(00.1)

The growth of NiO on GaN(00.1) substrates by plasma-assisted molecular beam epitaxy under oxygen rich conditions was investigated at growth temperatures between 100 $^{\circ}$C and 850 $^{\circ}$C. Epitaxial growth of NiO(111) with two rotational domains, with epitaxial relation $\normalsize{}\mathrm{\mathrm{\mathrm{NiO}(1\bar{\mathrm{1}}0)}\:||\:\mathrm{\mathrm{GaN}(11.0)}}$ and $\mathrm{\mathrm{\mathrm{NiO}\mathrm{(10\bar{\mathrm{1}})}\:||\:\mathrm{GaN(11.0)}}}$, was observed by X-ray diffraction (XRD) and confirmed by in-situ reflection high-energy electron diffraction as well as transmission electron microscopy (TEM) and electron backscatter diffraction. With respect to the high lattice mismatch of 8.1 % and a measured low residual tensile layer strain, growth by lattice matching epitaxy or domain matching epitaxy is discussed. The morphology measured by atomic force microscopy showed a grainy surface, probably arising from the growth by the columnar rotational domains visible in TEM micrographs. The domain sizes measured by AFM and TEM increase with the growth temperature, indicating an increasing surface diffusion length. Growth at 850 $^{\circ}$C, however, involved local decomposition of the GaN substrate that lead to an interfacial $\mathrmβ$-Ga$\mathrm{_{2}}$O$\mathrm{_{3}}$($\bar{\mathrm{2}}$01) layer and a high NiO surface roughness. Raman mesurements of the quasi-forbidden one-phonon peak indicate increasing layer quality (decreasing defect density) with increasing growth temperature. The results above suggest optimum growth temperatures around 700 $^{\circ}$C for high layer and interface quality.

physics.app-ph↗