arXiv subjects

Thomas Fromherz

Publications and source records attributed to Thomas Fromherz.

14 recordsLinked to original sources

arXiv2026

Self-Assembled Telecom Color Centers in Silicon and Their Growth Environment

Artificial atoms based on color centers in silicon (SiCCs) have recently emerged as promising candidates for highly integrable and scalable key components in photonic quantum technology, including telecom single-photon sources and spin memory devices. A novel all-epitaxial fabrication technique for SiCCs, based on ultra-low-temperature (ULT) molecular beam epitaxy (MBE), addresses limitations of conventional fabrication via ion implantation, such as vertical ion straggle and collateral crystal lattice damage. This method solely relies on self-assembly of SiCCs during kinetically-limited growth of (carbon-doped) Si(:C) at ULTs <~350{\deg}C. The latter requires an extraordinary pristine growth environment to prevent unintended defect formation caused by the incorporation of impurities from the background vapor; however, so far, no study has specifically addressed how exactly the vacuum conditions during epitaxy influence SiCC formation, their optical properties, and the quality of the surrounding crystal matrix. Here, we investigate the impact of the growth pressure and the substrate temperature on the self-assembly and photoluminescence (PL) properties of important SiCCs, such as W, G, G', and T centers. Further, we use PL and Doppler broadening variable energy positron annihilation spectroscopy to emphasize the role of the growth pressure in suppressing the luminescence background, which is crucial for advancing quantum photonics applications.

cond-mat.mes-hall↗

arXiv2024

Ge epitaxy at ultra-low growth temperatures enabled by a pristine growth environment

Germanium (Ge), the next-in-line group-IV material, bears great potential to add functionality and performance to next-generation nanoelectronics and solid-state quantum transport based on silicon (Si) technology. Here, we investigate the direct epitaxial growth of two-dimensional high-quality crystalline Ge layers on Si deposited at ultra-low growth temperatures ($T_{Ge} = 100^{\circ}\mathrm{C}-350^{\circ}\mathrm{C}$) and pristine growth pressures ($\lesssim 10^{-10}\,\mathrm{mbar}$). First, we show that $T_{Ge}$ does not degrade the crystal quality of homoepitaxial Ge/Ge(001) by comparing the point defect density using positron annihilation lifetime spectroscopy. Subsequently, we present a systematic investigation of the Ge/Si(001) heteroepitaxy, varying the Ge coverage (${\theta}_{Ge}$, 1, 2, 4, 8, 12, and 16 nm) and $T_{Ge}$ ($100^{\circ}\mathrm{C}$ to $300^{\circ}\mathrm{C}$, in increments of $50^{\circ}\mathrm{C}$) to assess the influence of these parameters on the layer's structural quality. Atomic force microscopy revealed a rippled surface topography with superimposed grainy features and the absence of three-dimensional structures, such as quantum dots. Transmission electron microscopy unveiled pseudomorphic, grains of highly crystalline growth separated by defective domains. Thanks to nanobeam scanning x-ray diffraction measurements, we were able to evidence the lattice strain fluctuations due to the ripple-like structure of the layers. We conclude that the heteroepitaxial strain contributes to the formation of the ripples, which originate from the kinetic limitations of the ultra-low temperatures.

cond-mat.mtrl-sci↗

arXiv2024

A group-IV double heterostructure light emitting diode for room temperature gain in Silicon

The lack of straightforward epitaxial integration of useful telecom lasers on silicon remains the major bottleneck for bringing optical interconnect technology down to the on-chip level. Crystalline silicon itself, an indirect semiconductor, is a poor light emitter. Here, we identify conceptionally simple Si/Si$_{1-x}$Ge$_x$/Si double heterostructures (DHS) with large Ge content ($x \gtrsim 0.4$) as auspicious gain material suitable for Si-based integrated optics. In particular, using self-consistent Poisson-current transport calculations, we show that Si diodes containing a 16 nm thick Si$_{1-x}$Ge$_x$ layer of high crystalline quality, centered at the p-n junction, results in efficient carrier accumulation in the DHS and gain if the diode is driven in forward direction. Despite the high strain, we unambiguously demonstrate that such prior unattainable defect-free DHS can be fabricated using ultra-low temperature epitaxy at pristine growth pressures. Telecom light emission is persistent up to 360 K, and directly linked to a ~160 meV high conduction band barrier for minority electron injection. This epitaxy approach allows further increasing the Ge content in the DHS and creating dot-in-well heterostructures for which even higher gains are predicted. Thus, the surprisingly facile DHS presented here can be an essential step toward novel classes of group-IV optoelectronic devices for silicon photonics.

cond-mat.mes-hall↗

arXiv2024

Telecom light-emitting diodes based on nanoconfined self-assembled silicon-based color centers

Silicon color centers (SiCCs) have recently emerged as potential building blocks for light emitters in Si photonics, quantum emitters with spin storage capabilities, and Si-based quantum repeaters. We have recently developed a non-invasive method to engineer carbon-related SiCCs confined to ultra-thin nanolayers within a pristine crystalline environment, which is of utmost importance for the photostability of SiCCs. Here, we demonstrate embedding these C-doping-based SiCCs into the only 9 nm wide intrinsic region of a p-i-n diode using the epitaxial self-assembly of color centers. We report electrically-pumped light emission with an exponential increase in the intensity as a function of the driving current until saturation. We associate this property with the shift of quasi-Fermi-level position upon electrical driving, which simultaneously improves the spectral homogeneity of the engineered SiCCs. Our study demonstrates the electrical control and driving of near-infrared emitters in high-quality silicon diodes, an essential milestone for advancing classical and quantum optoelectronics.

cond-mat.mes-hall↗

arXiv2024

All epitaxial self-assembly of vertically-confined silicon color centers using ultra-low temperature epitaxy

Silicon-based color-centers (SiCCs) have recently emerged as quantum-light sources that can be combined with telecom-range Si Photonics platforms. Unfortunately, using current SiCC fabrication, deterministic control over the vertical emitter position is impossible due to ion-implantation's stochastic nature. To overcome this bottleneck towards high-yield integration, we demonstrate a radically innovative creation method for various SiCCs, solely relying on epitaxial growth of Si and C-doped Si at atypically-low temperatures in a ultra-clean growth environment. These telecom emitters can be confined within sub-1nm thick layers embedded at arbitrary vertical positions within a highly crystalline Si matrix. Tuning growth conditions and doping, different SiCC types, e.g., W-centers, T-centers, G-centers, or derivatives like G'-centers can be created, which are particularly promising as Si-based single-photon sources and spin-photon interfaces. The zero-phonon emission from G'-centers can be conveniently tuned by the C-concentration, leading to a systematic wavelength shift and linewidth narrowing towards low emitter densities.

cond-mat.mes-hall↗

arXiv2022

Single SiGe Quantum Dot Emission Deterministically Enhanced in a High-Q Photonic Crystal Resonator

We report the resonantly enhanced radiative emission from a single SiGe quantum dot (QD), which is deterministically embedded into a bichromatic photonic crystal resonator (PhCR) at the position of its largest modal electric field by a scalable method. By optimizing our molecular beam epitaxy (MBE) growth technique, we were able to reduce the amount of Ge within the whole resonator to obtain an absolute minimum of exactly one QD, accurately positioned by lithographic methods relative to the PhCR, and an otherwise flat, a few monolayer thin, Ge wetting layer (WL). With this method, record quality (Q) factors for QD-loaded PhCRs up to $Q\sim 10^5$ are achieved. A comparison with control PhCRs on samples containing a WL but no QDs is presented, as well as a detailed analysis of the dependence of the resonator-coupled emission on temperature, excitation intensity, and emission decay after pulsed excitation. Our findings undoubtedly confirm a single QD in the center of the resonator as a potentially novel photon source in the telecom spectral range.

physics.optics↗

arXiv2021

Photoluminescence enhancement by deterministically site-controlled, vertically stacked SiGe quantum dots

The Si/SiGe heterosystem would be ideally suited for the realization of complementary metal-oxide-semiconductor (CMOS)-compatible integrated light sources, but the indirect band gap, exacerbated by a type-II band offset, makes it challenging to achieve efficient light emission. We address this problem by strain engineering in ordered arrays of vertically close-stacked SiGe quantum dot (QD) pairs. The strain induced by the respective lower QD creates a preferential nucleation site for the upper one and strains the upper QD as well as the Si cap above it. Electrons are confined in the strain pockets in the Si cap, which leads to an enhanced wave function overlap with the heavy holes near the upper QD's apex. With a thickness of the Si spacer between the stacked QDs below 5 nm, we separated the functions of the two QDs: The role of the lower one is that of a pure stressor, whereas only the upper QD facilitates radiative recombination of QD-bound excitons. We report on the design and strain engineering of the QD pairs via strain-dependent Schrödinger-Poisson simulations, their implementation by molecular beam epitaxy, and a comprehensive study of their structural and optical properties in comparison with those of single-layer SiGe QD arrays. We find that the double QD arrangement shifts the thermal quenching of the photoluminescence signal at higher temperatures. Moreover, detrimental light emission from the QD-related wetting layers is suppressed in the double-QD configuration.

cond-mat.mes-hall↗

arXiv2020

Selective tuning of optical modes in a silicon comb-like photonic crystal cavity

Realizing multiply resonant photonic crystal cavities with large free spectral range is key to achieve integrated devices with highly efficient nonlinear response, such as frequency conversion, four-wave mixing, and parametric oscillation. This task is typically difficult owing to the cavity modes' sensitivity to fabrication disorder, which makes it hard to reliably achieve a comb-like spectrum of equally spaced modes even when a perfect matching is theoretically predicted. Here we show that a comb-like spectrum of up to 8 modes with very high quality factor and diffraction limited volumes can be engineered in the bichromatic-type potential of a two-dimensional photonic crystal cavity fabricated in a thin silicon membrane. To cope with the tight tolerance in terms of frequency spacings and resonance linewidths, we develop a permanent post-processing technique that allows the selective tuning of individual confined modes, thus achieving an almost perfect frequency matching of high Q resonances with record finesse in silicon microresonators. Our experimental results are extremely promising in view of ultra-low power nonlinear photonics in silicon.

physics.optics↗

arXiv2019

Resolving the temporal evolution of line broadening in quantum emitters

Light emission from solid-state quantum emitters is inherently prone to environmental decoherence, which results in an inhomogeneous line broadening and in the deterioration of photon indistinguishability. Here we employ photon correlation Fourier spectroscopy (PCFS) to study the temporal evolution of such a broadening for the biexciton and exciton emission in resonantly driven GaAs quantum dots. Differently from previous experiments, the time scales we probe range from a few nanoseconds to milliseconds and, simultaneously, the spectral resolution we achieve can be as small as 2 $μ$eV. We find pronounced differences in the temporal evolution of the two lines, which we attribute to differences in their homogeneous linewidth and sensitivity to charge noise. We then analyze the effect of irradiation with additional white light, which reduces blinking at the cost of enhanced charge noise. Due to its robustness against experimental imperfections and its high temporal resolution and bandwidth, PCFS outperforms established spectroscopy techniques, such as Michelson interferometry. We discuss its practical implementation, its limitations, and the possibility to use it to estimate the indistinguishability of consecutively emitted single photons for applications in quantum communication and photonic-based quantum information processing.

cond-mat.mes-hall↗

arXiv2018

Effect of second order piezoelectricity on excitonic structure of stress-tuned InGaAs/GaAs quantum dots

We study the effects of the nonlinear piezoelectricity and the In distribution on the exciton energy, the electron-hole electric dipole moment, and the fine-structure splitting in stress-tunable InGaAs/GaAs quantum dots integrated onto a piezoelectric actuator. In particular, we investigate in detail the contributions of various elements of the expansion of the electrical polarization in terms of externally induced elastic strain on the latter two important quantum dot properties. Based on the comparison of the effects of first- and second-order piezoelectricity we provide a simple relation to estimate the influence of applied anisotropic stress on the quantum dot dipole moment for quantum dots significantly lattice mismatched to the host crystal.

cond-mat.mes-hall↗

arXiv2017

Inversion of the exciton built-in dipole moment in In(Ga)As quantum dots via nonlinear piezoelectric effect

We show that anisotropic biaxial stress can be used to tune the built-in dipole moment of excitons confined in In(Ga)As quantum dots up to complete erasure of its magnitude and inversion of its sign. We demonstrate that this phenomenon is due to piezoelectricity. We present a model to calculate the applied stress, taking advantage of the so-called piezotronic effect, which produces significant changes in the current-voltage characteristics of the strained diode-membranes containing the quantum dots. Finally, self-consistent k.p calculations reveal that the experimental findings can be only accounted for by the nonlinear piezoelectric effect, whose importance in quantum dot physics has been theoretically recognized although it has proven difficult to single out experimentally.

cond-mat.mes-hall↗

arXiv2016

Local Density-of-States Mapping in Photonic Crystal Resonators by Deterministically Positioned Germanium Quantum Dots

We report on mapping of the local density of states in L3 photonic crystal resonators (PCR) via deterministically positioned single Ge quantum dots (QDs). Perfect site-control of Ge QDs on pre-patterned silicon-on-insulator substrates was exploited to fabricate in one processing run almost 300 L3 PCRs containing single QDs in systematically varying positions in the cavities. The alignment precision of the QD emitters was better than 20 nm. This type of parallel processing is essentially based on standard Si device technologies and is therefore scalable to any number and configuration of PCR structures. As a first demonstrator, we probed the coupling efficiency of a single Ge QD to the L3 cavity modes as a function of their spatial overlap. The results are in very good agreement with finite-difference time-domain simulations.

physics.optics↗

arXiv2013

CMOS-compatible graphene photodetector covering all optical communication bands

Optical interconnects are becoming attractive alternatives to electrical wiring in intra- and inter-chip communication links. Particularly, the integration with silicon complementary metal-oxide-semiconductor (CMOS) technology has received considerable interest due to the ability of cost-effective integration of electronics and optics on a single chip. While silicon enables the realization of optical waveguides and passive components, the integration of another, optically absorbing, material is required for photodetection. Germanium or compound semiconductors are traditionally used for this purpose; their integration with silicon technology, however, faces major challenges. Recently, graphene has emerged as a viable alternative for optoelectronic applications, including photodetection. Here, we demonstrate an ultra-wideband CMOS-compatible photodetector based on graphene. We achieve multi-gigahertz operation over all fiber-optic telecommunication bands, beyond the wavelength range of strained germanium photodetectors, whose responsivity is limited by their bandgap. Our work complements the recent demonstration of a CMOS-integrated graphene electro-optical modulator, paving the way for carbon-based optical interconnects.

cond-mat.mes-hall↗

arXiv2013

Spontaneous emission enhancement from polymer-embedded colloidal PbS nanocrystals into Si-based photonics at telecom wavelengths

We experimentally demonstrate the coupling of optically excited PbS nanocrystal (NC) photoluminescence (PL) into Si-based ring resonators and waveguides at 300K. The PbS NCs are dissolved into Novolak polymer at various concentrations and applied by drop-casting. The coupling mechanism and the spontaneous emission enhancement are experimentally investigated and compared to theoretical predictions. Quality (Q) factors of 2500 were obtained in emission and transmission for wavelengths centered around 1.45μm. PL intensity shows a linear dependence on the excitation power and no degradation of the Q factors. Devices with stable optical properties are obtained by this versatile technique.

physics.optics↗