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Umutcan Bektas

Publications and source records attributed to Umutcan Bektas.

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Defect analysis of the $\beta$- to $\gamma$-Ga$_{2}$O$_{3}$ phase transition

In this study, we investigate the ion-irradiation-induced phase transition in gallium oxide (Ga2O3) from the $\beta$ to the $\gamma$ phase, the role of defects during the transformation, and the quality of the resulting crystal structure. Using a multi-method analysis approach including X-ray diffraction (XRD), transmission electron microscopy (TEM), Rutherford backscattering spectrometry in channeling mode (RBS/c), Doppler broadening variable energy positron annihilation spectroscopy (DB-VEPAS) and variable energy positron annihilation lifetime spectroscopy (VEPALS) supported by density functional theory (DFT) calculations, we have characterized defects at all the relevant stages before, during, and after the phase transition. Reduction in backscattering yield was observed in RBS/c spectra after the transition to the $\gamma$ phase. This is corroborated by a significant decrease in the positron trapping center density due to generation of embedded vacancies intrinsic for the $\gamma$-Ga2O3 but too shallow in order to trap positrons. A comparison of the observed positron lifetime of $\gamma$-Ga2O3 with different theoretical models shows good agreement with the three-site $\gamma$ phase approach. A characteristic increase in the effective positron diffusion length and the positron lifetime at the transition point from $\beta$-Ga2O3 to $\gamma$-Ga2O3 enables visualization of the phase transition with positrons for the first time. Moreover, a subsequent reduction of these quantities with increasing irradiation fluence was observed, which we attribute to further evolution of the $\gamma$-Ga2O3 and changes in the gallium vacancy density as well as relative occupation in the crystal lattice.

cond-mat.mtrl-sci

Universal radiation tolerant semiconductor

Radiation tolerance is determined as the ability of crystalline materials to withstand the accumulation of the radiation induced disorder. Nevertheless, for sufficiently high fluences, in all by far known semiconductors it ends up with either very high disorder levels or amorphization. Here we show that gamma/beta double polymorph Ga2O3 structures exhibit remarkably high radiation tolerance. Specifically, for room temperature experiments, they tolerate a disorder equivalent to hundreds of displacements per atom, without severe degradations of crystallinity; in comparison with, e.g., Si amorphizable already with the lattice atoms displaced just once. We explain this behavior by an interesting combination of the Ga- and O- sublattice properties in gamma-Ga2O3. In particular, O-sublattice exhibits a strong recrystallization trend to recover the face-centered-cubic stacking despite the stronger displacement of O atoms compared to Ga during the active periods of cascades. Notably, we also explained the origin of the beta-to-gamma Ga2O3 transformation, as a function of the increased disorder in beta-Ga2O3 and studied the phenomena as a function of the chemical nature of the implanted atoms. As a result, we conclude that gamma/beta double polymorph Ga2O3 structures, in terms of their radiation tolerance properties, benchmark a class of universal radiation tolerant semiconductors.

cond-mat.mtrl-sci