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W. C. T. Lee

Publications and source records attributed to W. C. T. Lee.

2 recordsLinked to original sources

Ultra-dense phosphorus in germanium delta-doped layers

Phosphorus (P) in germanium (Ge) delta-doped layers are fabricated in ultra-high vacuum by adsorption of phosphine molecules onto an atomically flat clean Ge(001) surface followed by thermal incorporation of P into the lattice and epitaxial Ge overgrowth by molecular beam epitaxy. Structural and electrical characterizations show that P atoms are confined, with minimal diffusion, into an ultra-narrow 2-nm-wide layer with an electrically-active sheet carrier concentration of 4x10^13 cm-2 at 4.2 K. These results open up the possibility of ultra-narrow source/drain regions with unprecedented carrier densities for Ge n-channel field effect transistors.

cond-mat.mes-hall↗

Atomic-scale patterning of hydrogen terminated Ge(001) by scanning tunneling microscopy

In this paper we demonstrate atomic-scale lithography on hydrogen terminated Ge(001. The lithographic patterns were obtained by selectively desorbing hydrogen atoms from a H resist layer adsorbed on a clean, atomically flat Ge(001) surface with a scanning tunneling microscope tip operating in ultra-high vacuum. The influence of the tip-to-sample bias on the lithographic process have been investigated. Lithographic patterns with feature-sizes from 200 nm to 1.8 nm have been achieved by varying the tip-to-sample bias. These results open up the possibility of a scanning-probe lithography approach to the fabrication of future atomic-scale devices in germanium.

cond-mat.mes-hall↗