arXiv subjects

Wan Chia Ang

Publications and source records attributed to Wan Chia Ang.

3 recordsLinked to original sources

arXiv2018

Multiple-Lithography-Compliant Verification for Standard Cell Library Development Flow

Starting from 22-nm, a standard cell must be designed to be full lithography-compliant, which includes Design Rule Check, Design-for-Manufacturability and Double-Patterning compliant. It has become a great challenge for physical layout designers to provide a full lithography-compliant standard cell layout that is optimized for area, power, timing, signal integrity, and yield. This challenge is further exacerbated with abutted single- and multiple-height standard cells. At present, different foundries and library vendors have different approaches for full lithography-compliant library preparation and validation. To the best of our knowledge, there is no single tool integrates all types of lithography-compliant check in standard cell libraries validation flow. In this work, we will demonstrate multiple lithography-compliant verification for standard cell library development flow. Validation flow and detailed algorithm implementation will be explained to assist engineers to achieve full lithography-compliant standard cell libraries. An area-efficient standard cell placement methodology will also be discussed to validate the issues arises from standard cell abutment.

cs.OH↗

arXiv2018

Standard Cell Library Evaluation with Multiple lithography-compliant verification and Improved Synopsys Pin Access Checking Utility

While standard cell layouts are drawn with minimum design rules to maximize the benefit of design area shrinkage, the complicated design rules have caused difficulties with signal routes accessing the pins in standard cell layouts. As a result, it has become a great challenge for physical layout designers to design a standard cell layout that is optimized for area, power, timing, signal integrity, and printability. Multiple design iterations are required to consider pin accessibility during standard cells layout to increase the number of feasible solutions available to the router. In this work, we will demonstrate several improvements with the Synopsys PAC methodology, such as reducing the number of cells required for each Synopsys 'testcell' with the same cell abutment condition, increasing the complexity of the pin connection for better pin accessibility evaluation. We also recommend additional constraints to improve the probability of detecting pin accessibility issues. We also integrate other physical verification methods to access the design rule compliance and the printability of standard cells. We hope that the easy to use utility enables layout engineers to perform the verification, simplifying the verification methodology.

cs.OH↗

arXiv2018

Constraining the Synopsys Pin Access Checker Utility for Improved Standard Cells Library Verification Flow

While standard cell layouts are drawn with minimum design rules for maximum benefit of design area shrinkage, the complicated design rules begin to cause difficulties with signal routes accessing the pins in standard cell layouts. Multiple design iterations are required to resolve routing issues, thus increasing the runtime and the overall chip area. To optimize the chip performance, power and area (PPA) and improve the routability, it is necessary to consider the pin accessibility during standard cell development phase so that each cell is designed to maximize the number of feasible pin-access solutions available to the router. As part of the Synopsys IC Compiler Library Preparation Reference Methodology, the Synopsys Pin Access Checker (PAC) reports DRC violations associated with the standard cell. Based on Synopsys PAC's methodology, we demonstrate several methods to improve the probability of detecting pin accessibility issues, such as reducing the number of cells required for each Synopsys 'testcell', increasing the complexity of the pin connectivity assignment and recommending the router constraints.

cs.OH↗