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Weihuang Yang

Publications and source records attributed to Weihuang Yang.

2 recordsLinked to original sources

Large and Controllable Spin-Valley Splitting in Two-Dimensional WS2/h-VN Heterostructure

Inspired by the profound physical connotations and potential application prospects of the valleytronics, we design a two-dimensional (2D) WS2/h-VN magnetic van der Waals (vdW) heterostructure and study the control of valley degree of freedom through the first-principles calculations. A considerable spin splitting of 627 meV is obtained at the K valley, accompanied with a strong suppression of that at the K' valley. An intrinsic large valley splitting of 376 meV is generated in the valence band, which corresponds to an effective Zeeman magnetic field of 2703 T. Besides of the valence band, the conduction band of WS2 possesses a remarkable spin splitting also, and valley labelled dark exciton states are present at the K' valley. The strengths of spin and valley splitting relied on the interfacial orbital hybridization are further tuned continually by the in-plane strain and interlayer spacing. Maximum spin and valley splitting of 654 and 412 meV are finally achieved, respectively, and the effective Zeeman magnetic field can be enhanced to 2989T with a -3 % strain. Time-reversal symmetry breaking and the sizable Berry curvature in the heterostructure lead to a prominent anomalous Hall conductivity at the K and K' valleys. Based on these finding, a prototype filter device for both the valley and spin is proposed.

physics.comp-ph

Mechanism of substrate-induced anisotropic growth of monolayer WS2 by kinetic Monte Carlo simulations

Controlled anisotropic growth of two-dimensional materials provides an approach for the synthesis of large single crystals and nanoribbons, which are promising for applications as low-dimensional semiconductors and in next-generation optoelectronic devices. In particular, the anisotropic growth of transition metal dichalcogenides induced by the substrate is of great interest due to its operability. To date, however, their substrate-induced anisotropic growth is typically driven by the optimization of experimental parameters without uncovering the fundamental mechanism. Here, the anisotropic growth of monolayer tungsten disulfide on an ST-X quartz substrate is achieved by chemical vapor deposition, and the mechanism of substrate-induced anisotropic growth is examined by kinetic Monte Carlo simulations. These results show that, besides the variation of substrate adsorption, the chalcogen to metal (C/M) ratio is a major contributor to the large growth anisotropy and the polarization of undergrowth and overgrowth; either perfect isotropy or high anisotropy can be expected when the C/M ratio equals 2.0 by properly controlling the linear relationship between gas flux and temperature.

cond-mat.mtrl-sci