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Weijia Kong

Publications and source records attributed to Weijia Kong.

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Attention-Guided Perturbation Network for Industrial Anomaly Detection

In unsupervised image anomaly detection, reconstruction-based methods learn normal patterns for data reconstruction, but often undesirably reconstruct anomalous regions at inference, resulting in missed detections. To alleviate this, existing approaches perturb normal samples in a sample-agnostic manner by uniformly injecting noise, ignoring that foreground regions are more critical for robust reconstruction. To address this limitation, we propose Attention-Guided Perturbation Network (AGPNet), a novel reconstruction framework for industrial anomaly detection. AGPNet introduces sample-aware attention masks to guide perturbations, enhancing the learning of invariant normal patterns at important locations. AGPNet consists of two branches, a reconstruction branch and an auxiliary attention-based perturbation one. The reconstruction branch focuses on learning to reconstruct normal samples, while the auxiliary branch generates attention masks to guide noise perturbation. By applying stronger perturbations to salient regions, the reconstruction branch learns intrinsic normal patterns in a more comprehensive and robust manner. Extensive experiments on MVTec-AD, VisA, and MVTec-3D show that AGPNet achieves competitive or leading performance across few-shot, one-class, and multi-class settings, with particularly strong performance in few-shot anomaly localization.

cs.CV

Impact of Oxygen Plasma Surface Treatment on Photoresist Adhesion in BaTiO3-Based Photonic Device Fabrication

Oxygen-plasma pre-cleans are routine before fabrication, but on BaTiO3 thin films we observed catastrophic photoresist lift-off during mild rinsing and sonication. To explain the failure, we combined optical microscopy, EDS, and XPS. EDS showed no meaningful bulk stoichiometry change, whereas XPS revealed a nanometer-scale, plasma-induced shift in surface chemistry: hydroxylation and carbonate formation consistent with a BaCO3-rich interphase at the resist/BaTiO3 boundary. This chemically weak interphase, recreated upon each plasma step and removable by simple solvent cleaning, provides the mechanism for delamination. The key takeaway for practitioners is process guidance: avoid uncritical O2-plasma use on BTO; if cleaning is required, use alternative chemistries (e.g., UV-ozone) or carefully tuned plasma windows that preserve adhesion. More broadly, the study illustrates how lightweight analytics at the surface (correlative microscopy + surface spectroscopy) can pinpoint the root cause of yield-limiting defects in oxide photonics and translate directly into higher-reliability process recipes.

cond-mat.mtrl-sci