arXiv subjects

Yasir J Noori

Publications and source records attributed to Yasir J Noori.

5 recordsLinked to original sources

arXiv2021

Lateral electrodeposition of MoS2 semiconductor over an insulator

Developing novel techniques for depositing transition metal dichalcogenides is crucial for the industrial adoption of 2D materials in optoelectronics. In this work, the lateral growth of molybdenum disulfide (MoS2) over an insulating surface is demonstrated using electrochemical deposition. By fabricating a new type of microelectrodes, MoS2 2D films grown from TiN electrodes across opposite sides have been connected over an insulating substrate, hence, forming a lateral device structure through only one lithography and deposition step. Using a variety of characterization techniques, the growth rate of MoS2 has been shown to be highly anisotropic with lateral to vertical growth ratios exceeding 20-fold. Electronic and photo-response measurements on the device structures demonstrate that the electrodeposited MoS2 layers behave like semiconductors, confirming their potential for photodetection applications. This lateral growth technique paves the way towards room temperature, scalable and site-selective production of various transition metal dichalcogenides and their lateral heterostructures for 2D materials-based fabricated devices.

physics.app-ph↗

arXiv2021

Electrodeposited WS$_2$ Monolayers on Fabricated Graphene Electrodes

The development of scalable techniques to make 2D material heterostructures is a major obstacle that needs to be overcome before these materials can be implemented in device technologies industrially. Electrodeposition is an industrially compatible deposition technique that offers unique advantages in scaling 2D heterostructures. In this work, we demonstrate the electrodeposition of atomic layers of WS$_2$ over graphene electrodes using a single source precursor. Using conventional microfabrication techniques, graphene was patterned to create micro-electrodes where WS$_2$ was site-selectively deposited to form 2D heterostructures. We used various characterisation techniques, including atomic force microscopy, transmission electron microscopy, Raman spectroscopy and x-ray photoelectron spectroscopy to show that our electrodeposited WS$_2$ layers are highly uniform and can be grown over graphene at a controllable deposition rate. This technique to selectively deposit TMDCs over microfabricated graphene electrodes paves the way towards wafer-scale production of 2D material heterostructures for nanodevice applications.

physics.app-ph↗

arXiv2021

Phase Change Memory by GeSbTe Electrodeposition in Crossbar Arrays

Phase change memories (PCM) is an emerging type of non-volatile memory that has shown a strong presence in the data-storage market. This technology has recently attracted significant research interest in the development of non-Von Neumann computing architectures such as in-memory and neuromorphic computing. Research in these areas has been primarily motivated by the scalability potential of phase change materials and their compatibility with industrial nanofabrication processes. In this work, we are presenting our development of crossbar phase change memory arrays through the electrodeposition of GeSbTe (GST). We show that GST can be electrodeposited in microfabricated TiN crossbar arrays using a scalable process. Our phase switching test of the electrodeposited materials have shown that a SET/RESET resistance ratio of 2-3 orders of magnitude is achievable with a switching endurance of around 80 cycles. These results represent the first phase switching of electrodeposited GeSbTe in microfabricated crossbar arrays. Our work paves the way towards developing large memory arrays involving electrodeposited materials for passive selectors and phase switching devices. It also opens opportunities for developing a variety of different electronic devices using electrodeposited materials.

cond-mat.mtrl-sci↗

arXiv2021

Towards GaAs Thin-Film Tracking Detectors

Silicon-based tracking detectors have been used in several important applications, such as in cancer therapy using particle beams, and for the discovery of new elementary particles at the Large Hadron Collider at CERN. III-V semiconductor materials are an attractive alternative to silicon for this application, as they have some superior physical properties. They could meet the demands for fast timing detectors allowing time-of-flight measurements with ps resolution while being radiation tolerant and cost-efficient. As a material with a larger density, higher atomic number Z and much higher electron mobility than silicon, GaAs exhibits faster signal collection and a larger signal per μm of sensor thickness. In this work, we report on the fabrication of n-in-n GaAs thin-film devices intended to serve next-generation high-energy particle tracking detectors. Molecular beam epitaxy (MBE) was used to grow high-quality GaAs films with doping levels sufficiently low to achieve full depletion for detectors with an active thickness of 10 μm. The signal collection speed of the detector structures was assessed using the transient current technique (TCT). To elucidate the structural properties of the detector, Kelvin probe force microscopy (KPFM) was used, which confirmed the formation of the junction in the detector and revealed residual doping in the intrinsic layer. Our results suggest that GaAs thin films are suitable candidates to achieve thin and radiation-tolerant tracking detectors.

physics.ins-det↗

arXiv2019

Modelling Resistive and Phase Change Memory with Passive Selector Arrays -- A Matlab Tool

Memristor devices are crucial for developing neuromorphic computers and next-generation memory technologies. In this work, we provide a comprehensive modelling tool for simulating static DC reading operations of memristor crossbar arrays that use passive selectors with matrix algebra in MATLAB. The software tool was parallel coded and optimized to run with personal computers and distributed computer clusters with minimized CPU and memory consumption. Using the tool, we demonstrate the effect of changing the line resistance, array size, voltage selection scheme, selector diode's ideality factor, reverse saturation current, temperature and sense resistance on the electrical behavior and expected sense margin of one-diode-one-resistor crossbar arrays. We then investigate the effect of single and dual side array biasing and grounding on the dissipated current throughout the array cells. The tool we offer to the memristor community and the studies we present enables the design of larger and more practical memristor arrays for application in data storage and neuromorphic computing.

cs.NE↗