arXiv subjects

Yi-Ting Cheng

Publications and source records attributed to Yi-Ting Cheng.

2 recordsLinked to original sources

arXiv2026

Near-single-domain superconducting aluminum films on GaAs(111)A with exceptional crystalline quality for scalable quantum circuits

We have reproducibly grown near-single-domain superconducting aluminum (Al) films on GaAs(111)A wafers using molecular beam epitaxy. Synchrotron X-ray diffraction revealed twin-domain ratios of 0.00005 and 0.0003 for 19.4-nm- and 9.6-nm-thick films, respectively-the lowest reported for Al on any substrate and long considered unattainable for practical device platforms. Azimuthal scans across off-normal Al{$11\bar{1}$} reflections exhibit narrow full width at half maximum (FWHM) values down to $0.55^\circ$, unmatched by epi-Al grown by any other method. Normal scans showed a well-defined (111) orientation with pronounced Pendell\"osung fringes, and $\theta$-rocking-curve FWHM values down to $0.018^\circ$; the former indicates abrupt film-substrate and oxide-film interfaces. Electron backscatter diffraction mapping confirms macroscopic in-plane uniformity and the absence of $\Sigma$3 twin domains. Atomic force microscopy and scanning transmission electron microscopy confirmed atomically smooth surfaces and abrupt heterointerfaces. The films exhibit critical temperatures approaching bulk values, establishing a materials platform for scalable, high-coherence superconducting qubits.

quant-ph↗

arXiv2025

In situ Al$_2$O$_3$ passivation of epitaxial tantalum and aluminum films enables long-term stability in superconducting microwave resonators

Long-term stability of superconducting microwave resonators is essential for scalable quantum technologies; however, surface and interface degradation continue to limit device stability. Here, we demonstrate exceptional stability in microstrip resonators fabricated from epitaxial tantalum and aluminum films, protected by in situ deposited Al$_2$O$_3$ under ultra-high vacuum. These resonators initially exhibit internal quality factors (Qi) exceeding one million and maintain high performance with minimal degradation after up to fourteen months of air exposure. In contrast, devices relying on native surface oxides show substantial declines in Qi over time, indicating increased microwave losses. X-ray photoelectron spectroscopy reveals that the in situ Al$_2$O$_3$ effectively suppresses interfacial oxidation and preserves the chemical integrity of the underlying superconducting films, whereas native oxides permit progressive oxidation, leading to device degradation. These findings establish a robust, scalable passivation strategy that addresses a longstanding materials challenge in the development of superconducting quantum circuits.

quant-ph↗