arXiv subjects

Yuichiro Ando

Publications and source records attributed to Yuichiro Ando.

40 records · Page 3Linked to original sources

arXiv2013

Temperature Dependence of Spin Hall Angle of Palladium

In this study, the temperature dependence of the spin Hall angle of palladium (Pd) was experimentally investigated by spin pumping. A Ni80Fe20/Pd bilayer thin film was prepared, and a pure spin current was dynamically injected into the Pd layer. This caused the conversion of the spin current to a charge current owing to the inverse spin Hall effect. It was found that the spin Hall angle varies as a function of temperature, whereby the value of the spin Hall angle increases to ca. 0.02 at 123 K.

cond-mat.mtrl-sci↗

arXiv2013

Vertical Spin Transport in Al with Pd/Al/Ni80Fe20 Trilayer Films at Room Temperature by Spin Pumping

Spin pumping enables the vertical transport of pure spin current through Al in a Pd/Al/Ni80Fe20(Py) trilayer film, in which the Py acts as a spin battery. The spin current injected into the Al flows through the Al to reach the Pd, resulting in the generation of electromotive forces due to the inverse spin Hall effect in the Pd. The electromotive forces decreased with increasing thickness of the Al layer. A simple model based on the theory by Tserkovnyak et al., [Phys. Rev. B, 66, 224403 (2002)] allows an estimation of the spin coherence of the perpendicular spin transport in the Al of 61 nm. This comparatively short coherence is attributed to a reduction in spin pumping efficiency because of the roughness of the Al/Py interface.

cond-mat.mtrl-sci↗

arXiv2013

Dynamical Spin Injection into p-type Germanium at Room Temperature

We demonstrate dynamical spin injection into p-type germanium (Ge) at room temperature (RT) using spin pumping. The generated pure spin current is converted to a charge current by the inverse spin-Hall effect (ISHE) arising in the p-type Ge sample. A clear electromotive force due to the ISHE is detected at RT. The spin-Hall angle for p-type Ge is estimated to be θSHE = 2.6x10-3 at RT, which is much larger than that for p-type Si.

cond-mat.mtrl-sci↗

arXiv2012

An investigation of the inverted Hanle effect in highly-doped Si

The underlying physics of the inverted Hanle effect appearing in Si was experimentally investigated using a Si spin valve, where spin transport was realized up to room temperature. No inverted-Hanle-related signal was observed in a non-local 4-terminal scheme even the same ferromagnetic electrode was used, whereas the signal was detected in a non-local 3-terminal scheme. Although the origin of the inverted Hanle effect has been thought to be ascribed to interfacial roughness beneath a ferromagnetic electrode, our finding is inconsistent with the conventional interpretation. More importantly, we report that there were two different Hanle signals in a non-local 3-terminal scheme, one of which corresponds to the inverted Hanle signal but the other is ascribed to spin transport. These results strongly suggest that (1) there is room for discussion concerning the origin of the inverted Hanle effect, and (2) achievement of spin transport in a non-local 4-terminal scheme is indispensable for further understanding of spin injection, spin transport and spin coherence in Si. Our new findings provide a new and strong platform for arising discussion of the physical essence of Hanle-related spin phenomena.

cond-mat.mtrl-sci↗