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arXiv2026

OptiClear: Differentiable Curvilinear Design Rule Legalization for Inverse-Designed Photonic Devices

Photonic inverse design enables ultra-compact, high-performance devices with highly curvilinear and non-intuitive geometries, but the resulting layouts often violate fabrication design rules and hinder foundry manufacturing. Legalization methods designed for rectilinear Manhattan electrical layouts are not directly applicable to curvilinear inverse-designed photonic devices. Meanwhile, existing fabrication-aware inverse-design methods apply soft penalties on small features and sharp curvatures, but still cannot guarantee design-rule-compliant final layouts. In this work, we present OptiClear, a curvilinear design rule legalization framework for inverse-designed photonic devices. OptiClear provides two complementary legalization engines: OptiClear-R, a rule-based morphological legalizer that efficiently resolves violation regions through iterative morphology-guided mask processing, and OptiClear-D, a differentiable legalizer that formulates legalization as a minimum-distortion mask optimization problem under morphological stationary-point constraints, explicitly seeking a rule-compliant layout with minimal geometric deviation from the original design. We further develop customized differentiable morphological GPU operators that significantly improve the scalability of high-resolution mask legalization. Comprehensive evaluation across diverse inverse-designed photonic devices and a wide range of design-rule settings shows that OptiClear reduces design-rule violations from thousands to zero. The rule-based legalizer offers high runtime efficiency, while the differentiable legalizer more faithfully preserves the original optical functionality. This work establishes curvilinear design rule legalization as a practical post-design electronic-photonic design automation (EPDA) stage for translating high-performance inverse-designed photonic layouts into manufacturable tape-out-ready devices.

physics.optics↗

arXiv2025

LiDAR 2.0: Hierarchical Curvy Waveguide Detailed Routing for Large-Scale Photonic Integrated Circuits

Driven by innovations in photonic computing and interconnects, photonic integrated circuit (PIC) designs advance and grow in complexity. Traditional manual physical design processes have become increasingly cumbersome. Available PIC layout tools are mostly schematic-driven, which has not alleviated the burden of manual waveguide planning and layout drawing. Previous research in PIC automated routing is largely adapted from electronic design, focusing on high-level planning and overlooking photonic-specific constraints such as curvy waveguides, bending, and port alignment. As a result, they fail to scale and cannot generate DRV-free layouts, highlighting the need for dedicated electronic-photonic design automation tools to streamline PIC physical design. In this work, we present LiDAR, the first automated PIC detailed router for large-scale designs. It features a grid-based, curvy-aware A* engine with adaptive crossing insertion, congestion-aware net ordering, and insertion-loss optimization. To enable routing in more compact and complex designs, we further extend our router to hierarchical routing as LiDAR 2.0. It introduces redundant-bend elimination, crossing space preservation, and routing order refinement for improved conflict resilience. We also develop and open-source a YAML-based PIC intermediate representation and diverse benchmarks, including TeMPO, GWOR, and Bennes, which feature hierarchical structures and high crossing densities. Evaluations across various benchmarks show that LiDAR 2.0 consistently produces DRV-free layouts, achieving up to 16% lower insertion loss and 7.69x speedup over prior methods on spacious cases, and 9% lower insertion loss with 6.95x speedup over LiDAR 1.0 on compact cases. Our codes are open-sourced at https://github.com/ScopeX-ASU/LiDAR.

cs.ET↗