@misc{indiciaeccca5b467727,
  title = {Stress Development and Impurity Segregation during Oxidation of the Si(100) Surface},
  author = {Daniel J. Cole and Mike C. Payne and Lucio Colombi Ciacchi},
  year = {2008},
  doi = {10.1016/j.susc.2007.08.013},
  url = {https://arxiv.org/abs/0807.3426},
  note = {Source identifier: 0807.3426}
}