TY  - RPRT
TI  - Stress Development and Impurity Segregation during Oxidation of the Si(100) Surface
AU  - Daniel J. Cole
AU  - Mike C. Payne
AU  - Lucio Colombi Ciacchi
PY  - 2008
DO  - 10.1016/j.susc.2007.08.013
UR  - https://arxiv.org/abs/0807.3426
ID  - 0807.3426
ER  -