@misc{indiciae87d7f1db59c5,
  title = {Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2},
  author = {D. A. Ariskin and I. V. Schweigert and A. L. Alexandrov and A. Bogaerts and F. M. Peeters},
  year = {2008},
  doi = {10.1063/1.3095760},
  url = {https://arxiv.org/abs/0809.2177},
  note = {Source identifier: 0809.2177}
}