TY  - RPRT
TI  - Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2
AU  - D. A. Ariskin
AU  - I. V. Schweigert
AU  - A. L. Alexandrov
AU  - A. Bogaerts
AU  - F. M. Peeters
PY  - 2008
DO  - 10.1063/1.3095760
UR  - https://arxiv.org/abs/0809.2177
ID  - 0809.2177
ER  -