@misc{indiciaefac15eac0197,
  title = {Tunneling electroresistance effect in ferroelectric tunnel junctions at the nanoscale},
  author = {A. Gruverman and D. Wu and H. Lu and Y. Wang and H. W. Jang and C. M. Folkman and M. Ye. Zhuravlev and D. Felker and M. Rzchowski and C. -B. Eom and E. Y. Tsymbal},
  year = {2009},
  doi = {10.1021/nl901754t},
  url = {https://arxiv.org/abs/0906.1521},
  note = {Source identifier: 0906.1521}
}