TY  - RPRT
TI  - Diffuse-interface model for nanopatterning induced by self-sustained ion etch masking
AU  - S. Le Roy
AU  - E. Søndergård
AU  - M. Kildemo
AU  - I. S. Nerbø
AU  - M. Plapp
PY  - 2010
DO  - 10.1103/physrevb.81.161401
UR  - https://arxiv.org/abs/1003.1274
ID  - 1003.1274
ER  -