@misc{indiciae4f2e023ca589,
  title = {Atomic layer deposition of HfO2 on graphene from HfCl4 and H20},
  author = {Harry Alles and Jaan Aarik and Aleks Aidla and Aurelien Fay and Jekaterina Kozlova and Ahti Niilisk and Martti Pärs and Mihkel Rähn and Maciej Wiesner and Pertti Hakonen and Väino Sammelselg},
  year = {2010},
  doi = {10.2478/s11534-010-0098-5},
  url = {https://arxiv.org/abs/1005.1469},
  note = {Source identifier: 1005.1469}
}