@misc{indiciae946388aa42fa,
  title = {Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy \& Effective Top-Down Fabrication},
  author = {H. Bartolf and K. Inderbitzin and L. B. Gómez and A. Engel and A. Schilling},
  year = {2010},
  doi = {10.1088/0960-1317/20/12/125015},
  url = {https://arxiv.org/abs/1006.4736},
  note = {Source identifier: 1006.4736}
}