TY  - RPRT
TI  - Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication
AU  - H. Bartolf
AU  - K. Inderbitzin
AU  - L. B. Gómez
AU  - A. Engel
AU  - A. Schilling
PY  - 2010
DO  - 10.1088/0960-1317/20/12/125015
UR  - https://arxiv.org/abs/1006.4736
ID  - 1006.4736
ER  -