@misc{indiciaed6e6e86d9352,
  title = {Simulation of Boron Diffusion during Annealing of Silicon Substrates Undergone a High Fluence Ion Implantation},
  author = {O. I. Velichko and A. A. Hundoryna},
  year = {2010},
  url = {https://arxiv.org/abs/1007.3863},
  note = {Source identifier: 1007.3863}
}