TY  - RPRT
TI  - Simulation of Boron Diffusion during Annealing of Silicon Substrates Undergone a High Fluence Ion Implantation
AU  - O. I. Velichko
AU  - A. A. Hundoryna
PY  - 2010
UR  - https://arxiv.org/abs/1007.3863
ID  - 1007.3863
ER  -