@misc{indiciae31e39b5892da,
  title = {Molecular Dynamics Simulation of Chemical Vapor Deposition of Amorphous Carbon: Dependence on H/C Ratio of Source Gas},
  author = {Atsushi M. Ito and Arimichi Takayama and Seiki Saito and Noriyasu Ohno and Shin Kajita and Hiroaki Nakamura},
  year = {2010},
  doi = {10.1143/jjap.50.01ab01},
  url = {https://arxiv.org/abs/1009.1508},
  note = {Source identifier: 1009.1508}
}