TY  - RPRT
TI  - Molecular Dynamics Simulation of Chemical Vapor Deposition of Amorphous Carbon: Dependence on H/C Ratio of Source Gas
AU  - Atsushi M. Ito
AU  - Arimichi Takayama
AU  - Seiki Saito
AU  - Noriyasu Ohno
AU  - Shin Kajita
AU  - Hiroaki Nakamura
PY  - 2010
DO  - 10.1143/jjap.50.01ab01
UR  - https://arxiv.org/abs/1009.1508
ID  - 1009.1508
ER  -