@misc{indiciaebe57a47917e1,
  title = {Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis},
  author = {J. Pomplun and S. Burger and F. Schmidt and F. Scholze and C. Laubis and U. Dersch},
  year = {2010},
  doi = {10.1117/12.793032},
  url = {https://arxiv.org/abs/1011.2665},
  note = {Source identifier: 1011.2665}
}