@misc{indiciae47582de917fe,
  title = {Symbiotic Optimization of the Nanolithography and RF-Plasma Etching for Fabricating High-Quality Light-Sensitive Superconductors on the 50 nm Scale},
  author = {H. Bartolf and K. Inderbitzin and L. B. Gómez and A. Engel and A. Schilling and H. -W. Hübers and A. Semenov and K. Il'in and M. Siegel},
  year = {2010},
  url = {https://arxiv.org/abs/1011.4676},
  note = {Source identifier: 1011.4676}
}