@misc{indiciae373e2ce70a80,
  title = {Topographic phase boundary shifts and saturation for anisotropic ion straggle during sputter etching},
  author = {Emmanuel O. Yewande and Raphael O. Akande},
  year = {2010},
  url = {https://arxiv.org/abs/1011.6234},
  note = {Source identifier: 1011.6234}
}