@misc{indiciaef4dea619d35d,
  title = {Change in the microscopic diffusion mechanisms of boron implanted into silicon with increase in the annealing temperature},
  author = {O. I. Velichko and A. A. Hundorina},
  year = {2011},
  url = {https://arxiv.org/abs/1105.4270},
  note = {Source identifier: 1105.4270}
}