TY  - RPRT
TI  - Change in the microscopic diffusion mechanisms of boron implanted into silicon with increase in the annealing temperature
AU  - O. I. Velichko
AU  - A. A. Hundorina
PY  - 2011
UR  - https://arxiv.org/abs/1105.4270
ID  - 1105.4270
ER  -