@misc{indiciae0c20ee97c614,
  title = {Rigorous Simulations of 3D Patterns on Extreme Ultraviolet Lithography Masks},
  author = {S. Burger and L. Zschiedrich and J. Pomplun and F. Schmidt},
  year = {2011},
  doi = {10.1117/12.889831},
  url = {https://arxiv.org/abs/1105.6052},
  note = {Source identifier: 1105.6052}
}