TY  - RPRT
TI  - Rigorous Simulations of 3D Patterns on Extreme Ultraviolet Lithography Masks
AU  - S. Burger
AU  - L. Zschiedrich
AU  - J. Pomplun
AU  - F. Schmidt
PY  - 2011
DO  - 10.1117/12.889831
UR  - https://arxiv.org/abs/1105.6052
ID  - 1105.6052
ER  -