@misc{indiciae80eec0b7d83e,
  title = {Simulation of ion-implanted boron redistribution under different conditions of the transient enhanced diffusion suppression},
  author = {O. I. Velichko and A. P. Kavaliova},
  year = {2011},
  url = {https://arxiv.org/abs/1106.4845},
  note = {Source identifier: 1106.4845}
}