TY  - RPRT
TI  - Very low effective Schottky barrier height for erbium disilicide contacts on n-Si through arsenic segregation
AU  - Nicolas Reckinger
AU  - Claude Poleunis
AU  - Emmanuel Dubois
AU  - Constantin Augustin Dutu
AU  - Xiaohui Tang
AU  - Arnaud Delcorte
AU  - Jean-Pierre Raskin
PY  - 2011
DO  - 10.1063/1.3608159
UR  - https://arxiv.org/abs/1110.5461
ID  - 1110.5461
ER  -