@misc{indiciae18dbf8d50018,
  title = {Sub-Rayleigh lithography using high flux loss-resistant entangled states of light},
  author = {Shamir Rosen and Itai Afek and Yonatan Israel and Oron Ambar and Yaron Silberberg},
  year = {2012},
  doi = {10.1103/physrevlett.109.103602},
  url = {https://arxiv.org/abs/1201.0637},
  note = {Source identifier: 1201.0637}
}