@misc{indiciae74108cb46f8f,
  title = {Realizing lateral wrap-gated nanowire FETs: Controlling gate length with chemistry rather than lithography},
  author = {Kristian Storm and Gustav Nylund and Lars Samuelson and Adam P. Micolich},
  year = {2012},
  doi = {10.1021/nl104403g},
  url = {https://arxiv.org/abs/1201.3682},
  note = {Source identifier: 1201.3682}
}