TY  - RPRT
TI  - Realizing lateral wrap-gated nanowire FETs: Controlling gate length with chemistry rather than lithography
AU  - Kristian Storm
AU  - Gustav Nylund
AU  - Lars Samuelson
AU  - Adam P. Micolich
PY  - 2012
DO  - 10.1021/nl104403g
UR  - https://arxiv.org/abs/1201.3682
ID  - 1201.3682
ER  -