@misc{indiciae1ef882c97781,
  title = {Interstitial diffusion of ion-implanted boron in crystalline silicon},
  author = {O. I. Velichko and A. P. Kavaliova},
  year = {2012},
  url = {https://arxiv.org/abs/1207.0794},
  note = {Source identifier: 1207.0794}
}