@misc{indiciaea0177d207f4a,
  title = {Anisotropic Vapor HF etching of silicon dioxide for Si microstructure release},
  author = {Vikram Passi and Ulf Sodervall and Bengt Nilsson and Goran Petersson and Mats Hagberg and Christophe Krzeminski and Emmanuel Dubois and Bert Du Bois and Jean-Pierre Raskin},
  year = {2012},
  doi = {10.1016/j.mee.2012.01.005},
  url = {https://arxiv.org/abs/1207.2402},
  note = {Source identifier: 1207.2402}
}