@misc{indiciaefacd05046fdd,
  title = {Simulation of boron diffusion during low-temperature annealing of implanted silicon},
  author = {O. I. Velichko and A. P. Kavaliova},
  year = {2012},
  doi = {10.1007/s00339-012-7378-4},
  url = {https://arxiv.org/abs/1207.3512},
  note = {Source identifier: 1207.3512}
}