TY  - RPRT
TI  - Simulation of boron diffusion during low-temperature annealing of implanted silicon
AU  - O. I. Velichko
AU  - A. P. Kavaliova
PY  - 2012
DO  - 10.1007/s00339-012-7378-4
UR  - https://arxiv.org/abs/1207.3512
ID  - 1207.3512
ER  -