@misc{indiciaec6b3f2dd2ef0,
  title = {AFM and Raman studies of topological insulator materials subject to argon plasma etching},
  author = {Isaac Childres and Jifa Tian and Ireneusz Miotkowski and Yong Chen},
  year = {2012},
  doi = {10.1080/14786435.2012.728009},
  url = {https://arxiv.org/abs/1209.2919},
  note = {Source identifier: 1209.2919}
}