@misc{indiciae26fecb6de8f5,
  title = {Bimodal substrate biasing to control γ-Al2O3 deposition during reactive magnetron sputtering},
  author = {Marina Prenzel and Annika Kortmann and Adrian Stein and Achim von Keudell and Farwah Nahif and Jochen M. Schneider},
  year = {2013},
  doi = {10.1063/1.4819227},
  url = {https://arxiv.org/abs/1305.4805},
  note = {Source identifier: 1305.4805}
}