TY  - RPRT
TI  - Bimodal substrate biasing to control γ-Al2O3 deposition during reactive magnetron sputtering
AU  - Marina Prenzel
AU  - Annika Kortmann
AU  - Adrian Stein
AU  - Achim von Keudell
AU  - Farwah Nahif
AU  - Jochen M. Schneider
PY  - 2013
DO  - 10.1063/1.4819227
UR  - https://arxiv.org/abs/1305.4805
ID  - 1305.4805
ER  -