@misc{indiciae35a0e90fd731,
  title = {Effect of Thermal Annealing on Boron Diffusion, Micro-structural, Electrical and Magnetic properties of Laser Ablated CoFeB Thin Films},
  author = {G. Venkat Swamy and Himanshu Pandey and A. K. Srivastava and M. K. Dalai and K. K. Maurya and Rashmi and R. K. Rakshit},
  year = {2013},
  doi = {10.1063/1.4816811},
  url = {https://arxiv.org/abs/1305.7335},
  note = {Source identifier: 1305.7335}
}